Exposure apparatus, exposure method, and method for producing device

• US 20060170891A1
• Filed: 03/28/2006
• Published: 08/03/2006
• Est. Priority Date: 09/29/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Mizuno, Yasushi, Tanitsu, Osamu, Toyoda, Mitsunori, Hikima, Ikuo, Hagiwara, Tsuneyuki, Kita, Naonori, Nakagawa, Masahiro, Nishinaga, Hisashi, Emura, Nozomu
• Granted Patent: US 8,305,552 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70058 Mask illumination systems
• CPC Class Codes: G03F 7/7015 Details of optical elements
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/706 Aberration measurement
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

Claims

1-7. -7. (canceled)

8. An exposure apparatus which exposes a substrate by irradiating an exposure beam onto the substrate, the exposure apparatus comprising:

a projection optical system; and

a measuring unit which is arranged on an image plane side of the projection optical system and which has a light-transmitting section for allowing the exposure beam from the projection optical system to come thereinto, a light receiver, and a light-collecting member for allowing the light beam from the light-transmitting section to come into the light receiver, wherein;

the light-collecting member is arranged between the light-transmitting section and the light receiver so that the exposure beam from the projection optical system comes into the light-collecting member without passing through any gas.

9. The exposure apparatus according to claim 8, wherein the exposure beam, which has passed through the projection optical system, comes into the light-transmitting section of the measuring unit through a liquid.

10. The exposure apparatus according to claim 8, wherein the light-collecting member has a flat section which is opposed to the projection optical system, and the light-transmitting section is formed at the flat section.

11. The exposure apparatus according to claim 8, wherein the measuring unit has a plate-shaped member which has the light-transmitting section, and the light-collecting member makes tight contact with the plate-shaped member.

12. The exposure apparatus according to claim 11, wherein the plate-shaped member is arranged so that one surface is opposed to the projection optical system, the light-transmitting section is formed at a part of another surface, and the light-collecting member makes tight contact with the another surface.

30. The exposure apparatus according to claim 8, further comprising a stage which is movable on the image plane side of the projection optical system, wherein the light-transmitting section is arranged on the stage.

33. The exposure apparatus according to claim 30, wherein the stage is capable of retaining the substrate.

36. The exposure apparatus according to claim 30, further comprising a liquid supply mechanism which fills a space between the projection optical system and the light-transmitting section with any liquid.

39. The exposure apparatus according to claim 36, wherein the liquid supply mechanism fills the space between the projection optical system and the substrate with the liquid in order to expose the substrate.

91. The exposure apparatus according to claim 8, characterized by comprising a substrate holder which is movable while retaining the substrate, and the light receiver is provided on the substrate holder.

99. The exposure apparatus according to claim 8, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and an imaging characteristic of the projection optical system is measured on the basis of a light-receiving result.

107. The exposure apparatus according to claim 8, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and information about a radiation amount of the light beam which has passed through the projection optical system is measured on the basis of a light-receiving result.

115. The exposure apparatus according to claim 8, characterized in that the light receiver is detachable with respect to the exposure apparatus.

123. A method for producing a device, characterized by comprising using the exposure apparatus as defined in claim 8.

13. An exposure apparatus which exposes a substrate by irradiating an exposure beam through a liquid onto the substrate, the exposure apparatus comprising:

a projection optical system; and

a measuring unit which has a plate-shaped member provided with one surface arranged to be opposed to the projection optical system and provided with a light-transmitting section formed at a part of another surface and which has a light receiver for receiving the light beam from the light-transmitting section, wherein;

the light receiver of the measuring unit receives the exposure beam through the liquid provided between the projection optical system and the plate-shaped member.

31. The exposure apparatus according to claim 13, further comprising a stage which is movable on the image plane side of the projection optical system, wherein the light-transmitting section is arranged on the stage.

34. The exposure apparatus according to claim 31, wherein the stage is capable of retaining the substrate.

37. The exposure apparatus according to claim 31, further comprising a liquid supply mechanism which fills a space between the projection optical system and the light-transmitting section with any liquid.

40. The exposure apparatus according to claim 37, wherein the liquid supply mechanism fills the space between the projection optical system and the substrate with the liquid in order to expose the substrate.

92. The exposure apparatus according to claim 13, characterized by comprising a substrate holder which is movable while retaining the substrate, and the light receiver is provided on the substrate holder.

100. The exposure apparatus according to claim 13, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and an imaging characteristic of the projection optical system is measured on the basis of a light-receiving result.

108. The exposure apparatus according to claim 13, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and information about a radiation amount of the light beam which has passed through the projection optical system is measured on the basis of a light-receiving result.

116. The exposure apparatus according to claim 13, characterized in that the light receiver is detachable with respect to the exposure apparatus.

124. A method for producing a device, characterized by comprising using the exposure apparatus as defined in claim 13.

14. An exposure apparatus which exposes a substrate by irradiating an exposure beam through a liquid onto the substrate, the exposure apparatus comprising:

a projection optical system; and

a measuring unit which has a light-transmitting section provided on an image plane side of the projection optical system for allowing the exposure beam from the projection optical system to come thereinto through the liquid, a light receiver, and an optical system for allowing the light beam from the light-transmitting section to come into the light receiver, wherein;

the optical system is arranged between the light-transmitting section and the light receiver so that the light beam from the light-transmitting section comes into the optical system without passing through any gas.

15. The exposure apparatus according to claim 14, wherein the optical system of the measuring unit includes a light-collecting member which collects the light beam from the light-transmitting section to allow the light beam to come into the light receiver.

16. The exposure apparatus according to claim 15, wherein the optical system of the measuring unit includes a wavefront division element for allowing the light beam from the light-transmitting section to come into the light receiver by effecting wavefront division for the light beam from the light-transmitting section to perform light collection respectively.

17. The exposure apparatus according to claim 15, wherein the light-collecting member includes a microlens array element.

18. The exposure apparatus according to claim 16, wherein the light-collecting member includes a microlens array element.

19. The exposure apparatus according to claim 14, wherein the optical system of the measuring unit allows the light beam from the light-transmitting section to come into the light receiver by utilizing a refractive function.

20. The exposure apparatus according to claim 14, wherein the optical system of the measuring unit includes a diffusing member which allows the light beam from the light-transmitting section to come into the light receiver by diffusing the light beam.

21. The exposure apparatus according to claim 14, wherein the optical system of the measuring unit includes a waveguide member which allows the light beam from the light-transmitting section to come into the light receiver by effecting waveguide.

22. The exposure apparatus according to claim 14, wherein the optical system of the measuring unit allows the light beam from the light-transmitting section to come into the light receiver by utilizing a reflecting function for the light beam from the light-transmitting section.

23. The exposure apparatus according to claim 22, wherein the optical system of the measuring unit includes an optical integrator.

24. The exposure apparatus according to claim 14, wherein the optical system of the measuring unit includes a diffraction element which allows the light beam from the light-transmitting section to come into the light receiver by a diffracting function.

25. The exposure apparatus according to claim 14, wherein the optical system of the measuring unit includes an optical member in which a predetermined optical processing is applied to an outgoing plane for the light beam come from the light-transmitting section.

26. The exposure apparatus according to claim 14, wherein the optical system of the measuring unit includes a wavelength conversion member which converts a wavelength of the light beam come from the light-transmitting section into the light receiver.

27. The exposure apparatus according to claim 14, wherein the optical system of the measuring unit includes a fluorescent member.

28. The exposure apparatus according to claim 14, wherein the optical system of the measuring unit includes a plurality of optical elements, and the optical element, which is included in the plurality of optical elements and which is disposed nearest to the light-transmitting section, is arranged closely to the light-transmitting section.

29. The exposure apparatus according to claim 14, wherein the projection optical system has a numerical aperture NA of not less than 1.

32. The exposure apparatus according to claim 14, further comprising a stage which is movable on the image plane side of the projection optical system, wherein the light-transmitting section is arranged on the stage.

35. The exposure apparatus according to claim 32, wherein the stage is capable of retaining the substrate.

38. The exposure apparatus according to claim 32, further comprising a liquid supply mechanism which fills a space between the projection optical system and the light-transmitting section with any liquid.

41. The exposure apparatus according to claim 38, wherein the liquid supply mechanism fills the space between the projection optical system and the substrate with the liquid in order to expose the substrate.

93. The exposure apparatus according to claim 14, characterized by comprising a substrate holder which is movable while retaining the substrate, and the light receiver is provided on the substrate holder.

101. The exposure apparatus according to claim 14, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and an imaging characteristic of the projection optical system is measured on the basis of a light-receiving result.

109. The exposure apparatus according to claim 14, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and information about a radiation amount of the light beam which has passed through the projection optical system is measured on the basis of a light-receiving result.

117. The exposure apparatus according to claim 14, characterized in that the light receiver is detachable with respect to the exposure apparatus.

125. A method for producing a device, characterized by comprising using the exposure apparatus as defined in claim 14.

42. An exposure apparatus which exposes a substrate by irradiating an exposure beam through a liquid onto the substrate, the exposure apparatus comprising:

a projection optical system;

an optical member which has a light-transmitting section arranged on an image plane side of the projection optical system; and

a light receiver which receives the light beam which has passed through the projection optical system via the optical member, wherein;

a space between the light receiver and the optical member is filled with the liquid.

43. The exposure apparatus according to claim 42, wherein the light receiver receives the light beam which has passed through the projection optical system and the liquid in a state in which the space between the projection optical system and the optical member is filled with the liquid.

45. The exposure apparatus according to claim 42, wherein the light receiver has an optical element which is arranged at a position nearest to the optical member and a light-receiving element which receives the light beam which has passed through the optical element, and the space between the optical element and the optical member is filled with the liquid.

47. The exposure apparatus according to claim 42, wherein the light receiver has a light-receiving element, and the space between the light-receiving element and the optical member is filled with the liquid.

49. The exposure apparatus according to claim 42, further comprising a liquid supply unit which supplies the liquid to the space between the optical member and the light receiver.

51. The exposure apparatus according to claim 42, further comprising a liquid recovery unit which recovers the liquid from the space between the optical member and the light receiver.

53. The exposure apparatus according to claim 42, further comprising a communicating passage which makes communication between outside and inside of the space between the optical member and the light receiver.

55. The exposure apparatus according to claim 53, characterized in that the communicating passage includes a first through-hole which is formed at a predetermined position of the optical member.

57. The exposure apparatus according to claim 55, wherein the first through-hole includes a plurality of holes which are formed at positions opposed to one another with the light-transmitting section of the optical member intervening therebetween.

59. The exposure apparatus according to claim 55, wherein the first through-hole is provided inside a immersion area of the liquid with which a space between the projection optical system and the optical member is filled.

61. The exposure apparatus according to claim 53, wherein the communicating passage includes a second through-hole which is formed outside a immersion area of the liquid with which a space between the projection optical system and the optical member is filled.

63. The exposure apparatus according to claim 53, further comprising a liquid supply mechanism which is capable of supplying the liquid to a space between the projection optical system and the substrate during exposure process, wherein the liquid supply mechanism supplies the liquid to the space between the optical member and the light receiver via the communicating passage.

65. The exposure apparatus according to claim 53, further comprising a liquid recovery mechanism which is capable of recovering the liquid from a space between the projection optical system and the substrate during exposure process, wherein the liquid recovery mechanism recovers the liquid from the space between the optical member and the light receiver via the communicating passage.

69. The exposure apparatus according to claim 42, wherein the light receiver receives the light beam while moving the light-transmitting section relative to the light beam which has passed through the projection optical system.

78. The exposure apparatus according to claim 42, wherein the light receiver receives the light beam through the liquid while moving the optical member relative to the projection optical system.

81. The exposure apparatus according to claim 61, further comprising a recovery mechanism which recovers the liquid allowed to outflow from the communicating passage.

84. The exposure apparatus according to claim 55, further comprising a lid mechanism which opens/closes the communicating passage.

87. The exposure apparatus according to claim 84, wherein the lid mechanism closes the through-hole at least during exposure process for the substrate.

94. The exposure apparatus according to claim 42, characterized by comprising a substrate holder which is movable while retaining the substrate, and the light receiver is provided on the substrate holder.

102. The exposure apparatus according to claim 42, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and an imaging characteristic of the projection optical system is measured on the basis of a light-receiving result.

110. The exposure apparatus according to claim 42, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and information about a radiation amount of the light beam which has passed through the projection optical system is measured on the basis of a light-receiving result.

118. The exposure apparatus according to claim 42, characterized in that the light receiver is detachable with respect to the exposure apparatus.

126. A method for producing a device, characterized by comprising using the exposure apparatus as defined in claim 42.

44. An exposure apparatus which exposes a substrate by irradiating an exposure beam onto the substrate, the exposure apparatus comprising:

a projection optical system;

an optical member which has a light-transmitting section arranged on an image plane side of the projection optical system; and

a light receiver which receives the light beam which has passed through the projection optical system via the optical member, wherein;

a space between the light receiver and the optical member is filled with a liquid.

46. The exposure apparatus according to claim 44, wherein the light receiver has an optical element which is arranged at a position nearest to the optical member and a light-receiving element which receives the light beam which has passed through the optical element, and the space between the optical element and the optical member is filled with the liquid.

48. The exposure apparatus according to claim 44, wherein the light receiver has a light-receiving element, and the space between the light-receiving element and the optical member is filled with the liquid.

50. The exposure apparatus according to claim 44, further comprising a liquid supply unit which supplies the liquid to the space between the optical member and the light receiver.

52. The exposure apparatus according to claim 44, further comprising a liquid recovery unit which recovers the liquid from the space between the optical member and the light receiver.

54. The exposure apparatus according to claim 44, further comprising a communicating passage which makes communication between outside and inside of the space between the optical member and the light receiver.

56. The exposure apparatus according to claim 54, characterized in that the communicating passage includes a first through-hole which is formed at a predetermined position of the optical member.

58. The exposure apparatus according to claim 56, wherein the first through-hole includes a plurality of holes which are formed at positions opposed to one another with the light-transmitting section of the optical member intervening therebetween.

60. The exposure apparatus according to claim 56, wherein the first through-hole is provided inside a immersion area of the liquid with which a space between the projection optical system and the optical member is filled.

62. The exposure apparatus according to claim 54, wherein the communicating passage includes a second through-hole which is formed outside a immersion area of the liquid with which a space between the projection optical system and the optical member is filled.

64. The exposure apparatus according to claim 54, further comprising a liquid supply mechanism which is capable of supplying the liquid to a space between the projection optical system and the substrate during exposure process, wherein the liquid supply mechanism supplies the liquid to the space between the optical member and the light receiver via the communicating passage.

66. The exposure apparatus according to claim 54, further comprising a liquid recovery mechanism which is capable of recovering the liquid from a space between the projection optical system and the substrate during exposure process, wherein the liquid recovery mechanism recovers the liquid from the space between the optical member and the light receiver via the communicating passage.

70. The exposure apparatus according to claim 44, wherein the light receiver receives the light beam while moving the light-transmitting section relative to the light beam which has passed through the projection optical system.

79. The exposure apparatus according to claim 44, wherein the light receiver receives the light beam through the liquid while moving the optical member relative to the projection optical system.

82. The exposure apparatus according to claim 62, further comprising a recovery mechanism which recovers the liquid allowed to outflow from the communicating passage.

85. The exposure apparatus according to claim 56, further comprising a lid mechanism which opens/closes the communicating passage.

88. The exposure apparatus according to claim 85, wherein the lid mechanism closes the through-hole at least during exposure process for the substrate.

95. The exposure apparatus according to claim 44, characterized by comprising a substrate holder which is movable while retaining the substrate, and the light receiver is provided on the substrate holder.

103. The exposure apparatus according to claim 44, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and an imaging characteristic of the projection optical system is measured on the basis of a light-receiving result.

111. The exposure apparatus according to claim 44, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and information about a radiation amount of the light beam which has passed through the projection optical system is measured on the basis of a light-receiving result.

119. The exposure apparatus according to claim 44, characterized in that the light receiver is detachable with respect to the exposure apparatus.

127. A method for producing a device, characterized by comprising using the exposure apparatus as defined in claim 44.

67. An exposure apparatus which exposes a substrate by irradiating an exposure beam onto the substrate through a liquid, the exposure apparatus comprising:

a projection optical system;

an optical member which has a light-transmitting section arranged on an image plane side of the projection optical system; and

a light receiver having a light-receiving element which receives the light beam which has passed through the projection optical system via the optical member and which is provided in contact with the optical member.

68. The exposure apparatus according to claim 67, wherein the light receiver receives the light beam which has passed through the projection optical system and the liquid in a state in which a space between the projection optical system and the optical member is filled with the liquid.

71. The exposure apparatus according to claim 67, wherein the light receiver receives the light beam while moving the light-transmitting section relative to the light beam which has passed through the projection optical system.

96. The exposure apparatus according to claim 67, characterized by comprising a substrate holder which is movable while retaining the substrate, and the light receiver is provided on the substrate holder.

104. The exposure apparatus according to claim 67, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and an imaging characteristic of the projection optical system is measured on the basis of a light-receiving result.

112. The exposure apparatus according to claim 67, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and information about a radiation amount of the light beam which has passed through the projection optical system is measured on the basis of a light-receiving result.

120. The exposure apparatus according to claim 67, characterized in that the light receiver is detachable with respect to the exposure apparatus.

128. A method for producing a device, characterized by comprising using the exposure apparatus as defined in claim 67.

130. The exposure apparatus according to claim 67, wherein the optical member is an optical member which is installed at a position nearest to the projection optical system on the image plane side of the projection optical system.

132. The exposure apparatus according to claim 67, further comprising a substrate stage which is movable while retaining the substrate, wherein the light-transmitting section of the optical member is provided at the substantially same height position as that of a surface of the substrate stage.

72. An exposure apparatus which exposes a substrate by irradiating an exposure beam onto the substrate through a liquid, the exposure apparatus comprising:

a projection optical system;

an optical member which has a light-transmitting section arranged on an image plane side of the projection optical system and which has a through-hole formed at a predetermined position; and

a light receiver which receives the light beam which has passed through the projection optical system via the optical member.

73. The exposure apparatus according to claim 72, wherein the through-hole includes a plurality of holes which are formed at positions opposed to one another with the light-transmitting section of the optical member intervening therebetween.

74. The exposure apparatus according to claim 72, wherein a space between the optical member and the light receiver is filled with the liquid.

75. The exposure apparatus according to claim 72, wherein the light receiver receives the light beam in a state in which a space between the projection optical system and the optical member is filled with the liquid.

76. The exposure apparatus according to claim 72, wherein the through-hole is provided inside an immersion area of the liquid with which a space between the projection optical system and the optical member is filled.

77. The exposure apparatus according to claim 72, wherein a communicating passage, which makes communication between outside and inside of a space between the optical member and the light receiver, is provided outside an immersion area of the liquid with which a space between the projection optical system and the optical member is filled.

80. The exposure apparatus according to claim 72, wherein the light receiver receives the light beam through the liquid while moving the optical member relative to the projection optical system.

83. The exposure apparatus according to claim 73, further comprising a recovery mechanism which recovers the liquid allowed to outflow from the communicating passage.

86. The exposure apparatus according to claim 72, further comprising a lid mechanism which opens/closes the communicating passage.

89. The exposure apparatus according to claim 86, wherein the lid mechanism closes the through-hole at least during exposure process for the substrate.

97. The exposure apparatus according to claim 72, characterized by comprising a substrate holder which is movable while retaining the substrate, and the light receiver is provided on the substrate holder.

105. The exposure apparatus according to claim 72, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and an imaging characteristic of the projection optical system is measured on the basis of a light-receiving result.

113. The exposure apparatus according to claim 72, characterized in that the light receiver receives the light beam which has passed through the light-transmitting section, and information about a radiation amount of the light beam which has passed through the projection optical system is measured on the basis of a light-receiving result.

121. The exposure apparatus according to claim 72, characterized in that the light receiver is detachable with respect to the exposure apparatus.

129. A method for producing a device, characterized by comprising using the exposure apparatus as defined in claim 72.

131. The exposure apparatus according to claim 72, wherein the optical member is an optical member which is installed at a position nearest to the projection optical system on the image plane side of the projection optical system.

133. The exposure apparatus according to claim 72, further comprising a substrate stage which is movable while retaining the substrate, wherein the light-transmitting section of the optical member is provided at the substantially same height position as that of a surface of the substrate stage.

134. An exposure method for exposing a substrate by irradiating an exposure beam through a projection optical system and a liquid onto the substrate, the exposure method comprising the steps of:

installing a measuring unit for measuring the exposure beam on a side of a light-outgoing end of the projection optical system;

measuring the exposure beam by using the measuring unit without allowing the liquid to intervene in an optical path space on the side of the light-outgoing end of the projection optical system; and

exposing the substrate while allowing the liquid to intervene in the optical path space on the basis of a measurement result, wherein;

an incident angle of the exposure beam come from the projection optical system into an interface between the optical path space and the light-outgoing end of the projection optical system differs between the measuring step and the exposure step.

135. The exposure method according to claim 134, wherein the incident angle of the exposure beam come from the projection optical system into the interface between the space and the light-outgoing end of the projection optical system in the measuring step is smaller than that in the exposure step.

136. The exposure method according to claim 134, wherein the incident angle of the exposure beam is adjusted with a light flux distribution of the exposure beam in a plane conjugate with a pupil plane of the projection optical system.

137. The exposure method according to claim 136, wherein the angle of the exposure beam is adjusted by adjusting a coherence factor σ

of an illumination system provided on a side of a light-incoming end of the projection optical system.

138. The exposure method according to claim 137, further comprising adjusting the exposure beam or an imaging characteristic of the projection optical system on the basis of the measurement result.

139. An exposure method for exposing a substrate by irradiating an exposure beam through a projection optical system onto the substrate, the exposure method comprising:

receiving the exposure beam which has outgone from the projection optical system by a light receiver; and

exposing the substrate by irradiating the exposure beam through the projection optical system and a liquid.

140. The exposure method according to claim 139, wherein a light-collecting member and a light-transmitting section are arranged between the projection optical system and the light receiver, and the liquid exists between the light-transmitting section and the projection optical system.

141. The exposure method according to claim 140, wherein the light-transmitting section is formed for a plate-shaped member, and the light-collecting member is in tight contact with the plate-shaped member.

142. The exposure method according to claim 139, further comprising adjusting the exposure beam on the basis of a light-receiving signal of the light receiver.

143. The exposure method according to claim 139, further comprising adjusting an imaging characteristic of the projection optical system on the basis of a light-receiving signal of the light receiver.

144. An exposure method for exposing a substrate by irradiating an exposure beam through a projection optical system onto the substrate, the exposure method comprising:

receiving the light beam which has passed through the projection optical system by a light receiver via an optical member having a light-transmitting section arranged on an image plane side of the projection optical system; and

exposing the substrate by irradiating the exposure beam onto the substrate through the projection optical system, wherein;

a space between the light receiver and the optical member is filled with a liquid.

145. The exposure method according to claim 144, wherein the liquid exists between the substrate and the projection optical system when the substrate is exposed.

146. The exposure method according to claim 144, wherein the exposure beam is adjusted on the basis of a light-receiving signal of the light receiver.

147. The exposure method according to claim 144, wherein an imaging characteristic of the projection optical system is adjusted on the basis of a light-receiving signal of the light receiver.

148. The exposure method according to claim 144, wherein the light receiver is one of an irradiation irregularity sensor, a dose sensor, and a spatial image-measuring unit.