Apparatus for processing substrate
First Claim
1. A substrate processing apparatus comprising:
- a plurality of process chambers having a plurality of deposition chambers, each of the deposition chambers being provided with an opening formed through a sidewall thereof;
a transferring guide installed at an upper portion inside the deposition chambers;
at least one substrate supporter for supporting a substrate while the substrate is moved between the deposition chambers and a process for the substrate is performed, the substrate supporter being coupled to the transferring guide such that the substrate supporter is moved along the transferring guide; and
a deposition material supplying member for supplying a deposition material to the substrate supported by the substrate supporter, the deposition material supplying member being disposed under the transferring guide positioned in the deposition chamber, wherein the substrate supporter is moved between the process chambers through the opening along the transferring guide and the process for the substrate is performed while the substrate is supported by the substrate supporter coupled to the transferring guide.
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Accused Products
Abstract
In a substrate processing apparatus for forming thin layers on a substrate used for an organic light emitting diode, the apparatus includes a mask attaching chamber, a deposition chamber and a mask detaching chamber. The mask attaching chamber, the deposition chamber and the mask detaching chamber are provided with a transferring guide installed thereinside, and a substrate supporter for supporting the substrate moves along the transferring guide in or between the chambers. Thus, a time for processing the substrate and an area for the apparatus may be reduced. Also, the chambers are grouped in one or more, and a gate valve is installed between the grouped chambers for opening and closing a path between the grouped chambers. Accordingly, the chambers may be continuously maintained in a vacuum state when any one of the chambers is repaired.
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Citations
24 Claims
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1. A substrate processing apparatus comprising:
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a plurality of process chambers having a plurality of deposition chambers, each of the deposition chambers being provided with an opening formed through a sidewall thereof;
a transferring guide installed at an upper portion inside the deposition chambers;
at least one substrate supporter for supporting a substrate while the substrate is moved between the deposition chambers and a process for the substrate is performed, the substrate supporter being coupled to the transferring guide such that the substrate supporter is moved along the transferring guide; and
a deposition material supplying member for supplying a deposition material to the substrate supported by the substrate supporter, the deposition material supplying member being disposed under the transferring guide positioned in the deposition chamber, wherein the substrate supporter is moved between the process chambers through the opening along the transferring guide and the process for the substrate is performed while the substrate is supported by the substrate supporter coupled to the transferring guide. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A substrate processing apparatus comprising:
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a plurality of process chambers for attaching a mask having a pattern to a substrate, depositing a material on the substrate and detaching the mask from the substrate after the material is deposited on the substrate;
a transferring guide installed at an upper portion inside the process chambers;
at least one substrate supporter for supporting the substrate, the substrate supporter being coupled to the transferring guide such that the substrate supporter is moved inside the process chambers and between the process chambers; and
a deposition material supplying member for supplying the material to the substrate supported by the substrate supporter, the deposition material supplying member being disposed under the substrate supported by the substrate supporter, wherein the substrate is supported by the substrate supporter such that a face of the substrate, on which the material is deposited, faces a lower portion when a process for depositing the material on the substrate, and the substrate supporter is continuously moved along the transferring guide when the process for the substrate is performed or moved after the substrate supporter is stayed in a predetermined position by a predetermined time during the deposition process. - View Dependent Claims (22, 23, 24)
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Specification