Apparatus for processing substrate

• US 20060174829A1
• Filed: 01/31/2006
• Published: 08/10/2006
• Est. Priority Date: 02/07/2005
• Status: Active Grant

• Current Assignee: Semes Co., Ltd (Samsung Electronics Co. Ltd.)
• Original Assignee: Semes Co., Ltd (Samsung Electronics Co. Ltd.)
• Inventors: An, Ki-Choul, Lee, Seung-Bae, Ha, Tae-Young, Noh, Il-Ho, Joung, Young-Chul, Chang, Jung-Won
• Granted Patent: US 7,918,940 B2
• Time in Patent Office: Days
• US Class Current: 118/52
• CPC Class Codes: H01L 21/67173 in-line arrangement
• CPC Class Codes: H01L 21/67236 the substrates being processed being not semiconductor wafers, e.g. leadframes or chips
• CPC Class Codes: H01L 21/67748 horizontal transfer of a single workpiece

Abstract

In a substrate processing apparatus for forming thin layers on a substrate used for an organic light emitting diode, the apparatus includes a mask attaching chamber, a deposition chamber and a mask detaching chamber. The mask attaching chamber, the deposition chamber and the mask detaching chamber are provided with a transferring guide installed thereinside, and a substrate supporter for supporting the substrate moves along the transferring guide in or between the chambers. Thus, a time for processing the substrate and an area for the apparatus may be reduced. Also, the chambers are grouped in one or more, and a gate valve is installed between the grouped chambers for opening and closing a path between the grouped chambers. Accordingly, the chambers may be continuously maintained in a vacuum state when any one of the chambers is repaired.

Claims

1. A substrate processing apparatus comprising:

a plurality of process chambers having a plurality of deposition chambers, each of the deposition chambers being provided with an opening formed through a sidewall thereof;

a transferring guide installed at an upper portion inside the deposition chambers;

at least one substrate supporter for supporting a substrate while the substrate is moved between the deposition chambers and a process for the substrate is performed, the substrate supporter being coupled to the transferring guide such that the substrate supporter is moved along the transferring guide; and

a deposition material supplying member for supplying a deposition material to the substrate supported by the substrate supporter, the deposition material supplying member being disposed under the transferring guide positioned in the deposition chamber,

wherein the substrate supporter is moved between the process chambers through the opening along the transferring guide and the process for the substrate is performed while the substrate is supported by the substrate supporter coupled to the transferring guide.

2. The substrate processing apparatus of claim 1, further comprising a gate valve for opening or closing the opening to allow inner portions of the process chambers to be separated from each other,

wherein inner portions of the deposition chambers are maintained in a vacuum state when the process for the substrate is performed.

3. The substrate processing apparatus of claim 1, wherein each of the process chambers further comprises:

a mask attaching chamber in which a process for attaching a mask having a predetermined pattern to the substrate is performed, the mask attaching chamber being installed at a first side of the deposition chamber and provided with an opening through which the substrate is moved; and

a mask detaching chamber in which a process for detaching the mask from the substrate, the mask detaching chamber being installed at a second side of the deposition chamber and provided with an opening through which the substrate is moved.

4. The substrate processing apparatus of claim 3, further comprising a gate valve for opening and closing the opening,

wherein inner portions of the deposition chambers are maintained in a vacuum state when the process for the substrate is performed, the mask attaching chamber, the deposition chamber and the mask detaching chamber are divided into one or more groups, and the gate valve opens and closes the opening installed between the groups of the mask attaching chamber, the deposition chamber and the mask detaching chamber.

5. The substrate processing apparatus of claim 1, wherein the substrate is a substrate used to fabricate an organic light emitting diode.

6. The substrate processing apparatus of claim 1, wherein the substrate supporter comprises an adhere-layer formed on a lower face thereof, and the substrate is attached to the substrate supporter by the adhere-layer.

7. The substrate processing apparatus of claim 1, wherein the deposition material supplying member comprises:

a supplying container for containing the deposition material; and

a heating member for heating the supplying container such that the deposition material is supplied to the substrate when the process for the substrate is performed.

8. The substrate processing apparatus of claim 1, further comprising a blocking plate through which an opening facing an upper portion of the deposition material supplying member is formed, the blocking plate being installed between the substrate attached to the substrate supporter and the deposition material supplying member,

wherein the blocking plate prevents the deposition material supplied from the deposition material supplying member from being moved through the opening of the deposition chamber or deposited at the transferring guide.

9. The substrate processing apparatus of claim 8, wherein the substrate supporter is continuously moved along the transferring guide when the process for the substrate is performed.

10. The substrate processing apparatus of claim 8, wherein the substrate supporter is moved after the substrate supporter is stayed in a predetermined position by a predetermined time when the process for the substrate is performed.

11. The substrate processing apparatus of claim 1, further comprising a cover for covering an opening through which the deposition material in the deposition material supplying member is supplied to the deposition chamber.

12. The substrate processing apparatus of claim 3, further comprising a returning guide for returning the substrate supporter from which the substrate is detached, the returning guide being disposed on the transferring guide in the process chambers,

wherein the substrate supporter moves the mask from the mask detaching chamber to the mask attaching chamber while returning along the transferring guide.

13. The substrate processing apparatus of claim 3, further comprising a mask returning member for moving the mask from the mask detaching chamber to the mask attaching chamber along transferring guide,

wherein the deposition chamber provides a buffer space therein at which the mask returning member temporarily stays.

14. The substrate processing apparatus of claim 13, wherein the buffer space is provided at an upper portion of the transferring guide of the deposition chamber.

15. The substrate processing apparatus of claim 13, further comprising a returning guide for returning a substrate transferring member that transfers the substrate between the process chambers,

wherein the returning guide is installed outside the process chambers.

16. The substrate processing apparatus of claim 13, wherein the buffer space is provided inside the mask attaching chamber and the mask detaching chamber are provided with a buffer space, at which the mask returning member temporarily stays.

17. The substrate processing apparatus of claim 1, wherein the substrate supporter comprises:

a supporting plate for supporting the substrate; and

a driving roller that rolls on an upper face of the transferring guide when the supporting plate is transferred along the transferring guide, the driving roller being combined with a lower face of the supporting plate.

18. The substrate processing apparatus of claim 17, wherein the substrate supporter further comprises a guide roller that rolls along a side face of the transferring guide in order to prevent deviation of the supporting plate from the transferring guide toward a direction substantially perpendicular to a longitudinal direction of the transferring guide when the supporting plate is transferred along the transferring guide.

19. The substrate processing apparatus of claim 17, wherein the lower face of the supporting plate comprises:

a center portion for supporting the substrate;

an end portion at which the driving roller is installed; and

a first bend portion formed between the center portion and the end portion,

wherein the upper face of the transferring guide comprises;

a road portion that makes contact with the driving roller; and

a second bend portion that faces the first bend portion and that is corresponding to the first bend portion.

20. The substrate processing apparatus of claim 17, further comprising a driver for driving the substrate supporter,

wherein the driver comprises:

a rack gear formed on a sidewall of the supporting plate;

a pinion gear combined with the rack gear;

a first rotation axle rotated by a motor;

a first magnetic substance into which the first rotation axle is inserted;

a second rotation axle for rotating the pinion gear, the second rotation axle being substantially perpendicular to the first rotation axle; and

a second magnetic substance for transmitting a rotational force from the first rotation axle to the second rotation axle, the second rotation axle being inserted into the second magnetic substance and the second magnetic substance being substantially perpendicular to the first magnetic substance.

21. A substrate processing apparatus comprising:

a plurality of process chambers for attaching a mask having a pattern to a substrate, depositing a material on the substrate and detaching the mask from the substrate after the material is deposited on the substrate;

a transferring guide installed at an upper portion inside the process chambers;

at least one substrate supporter for supporting the substrate, the substrate supporter being coupled to the transferring guide such that the substrate supporter is moved inside the process chambers and between the process chambers; and

a deposition material supplying member for supplying the material to the substrate supported by the substrate supporter, the deposition material supplying member being disposed under the substrate supported by the substrate supporter,

wherein the substrate is supported by the substrate supporter such that a face of the substrate, on which the material is deposited, faces a lower portion when a process for depositing the material on the substrate, and the substrate supporter is continuously moved along the transferring guide when the process for the substrate is performed or moved after the substrate supporter is stayed in a predetermined position by a predetermined time during the deposition process.

22. The substrate processing apparatus of claim 21, wherein the process chambers comprises:

a mask attaching chamber of which a process for attaching the mask to the substrate is performed;

a mask detaching chamber of which a process for detaching the mask from the substrate is performed; and

a deposition chamber of which the deposition process is performed, the deposition chamber being disposed between the mask attaching chamber and the mask detaching chamber and combined with the deposition material supplying member,

wherein the mask attaching chamber, the mask detaching chamber and the deposition chamber are provided with an opening formed through a sidewall thereof and the substrate is moved through the opening.

23. The substrate processing apparatus of claim 22, further comprising a gate valve for opening and closing the opening,

wherein an inner portion of the mask attaching chamber, the mask detaching chamber and the deposition chamber is maintained in a vacuum state when the deposition process for the substrate is performed, the mask attaching chamber, the deposition chamber and the mask detaching chamber are divided into one or more groups, and the gate valve opens and closes the opening installed between the groups of the mask attaching chamber, the deposition chamber and the mask detaching chamber.

24. The substrate processing apparatus of claim 22, further comprising a returning guide for returning the substrate supporter from which the substrate is detached, the returning guide being disposed on the transferring guide in the process chambers,

wherein the substrate supporter moves the mask from the mask detaching chamber to the mask attaching chamber while the substrate supporter is returned along the transferring guide.