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Lithographic apparatus, device manufacturing method, and device manufactured thereby

  • US 20060176463A1
  • Filed: 02/02/2006
  • Published: 08/10/2006
  • Est. Priority Date: 12/31/2003
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus comprising:

  • a radiation system that provides a beam of radiation;

    a support structure that supports a patterning structure, the patterning structure configured to pattern the beam of radiation according to a desired pattern;

    a substrate support that supports a substrate;

    a projection system that projects the patterned beam onto a target portion of the substrate, said projection system including an optical element that has a beam entry area and an optical element that has a beam exit area through each of which said patterned beam passes; and

    a nucleated surface associated with said projection system on which a plurality of nucleation sites are provided, said surface being disposed away from at least one of said beam entry area and said beam exit area.

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