Lithographic apparatus, device manufacturing method, and device manufactured thereby
First Claim
1. A lithographic projection apparatus comprising:
- a radiation system that provides a beam of radiation;
a support structure that supports a patterning structure, the patterning structure configured to pattern the beam of radiation according to a desired pattern;
a substrate support that supports a substrate;
a projection system that projects the patterned beam onto a target portion of the substrate, said projection system including an optical element that has a beam entry area and an optical element that has a beam exit area through each of which said patterned beam passes; and
a nucleated surface associated with said projection system on which a plurality of nucleation sites are provided, said surface being disposed away from at least one of said beam entry area and said beam exit area.
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Accused Products
Abstract
A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.
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Citations
10 Claims
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1. A lithographic projection apparatus comprising:
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a radiation system that provides a beam of radiation;
a support structure that supports a patterning structure, the patterning structure configured to pattern the beam of radiation according to a desired pattern;
a substrate support that supports a substrate;
a projection system that projects the patterned beam onto a target portion of the substrate, said projection system including an optical element that has a beam entry area and an optical element that has a beam exit area through each of which said patterned beam passes; and
a nucleated surface associated with said projection system on which a plurality of nucleation sites are provided, said surface being disposed away from at least one of said beam entry area and said beam exit area. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A device manufacturing method comprising:
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projecting a beam of radiation;
patterning the beam of radiation;
projecting the patterned beam of radiation using an optical element having a beam entry area and an optical element having a beam exit area through each of which said patterned beam passes, onto a target portion of the layer of radiation-sensitive material; and
capturing contaminants with a plurality of nucleation sites spaced from at least one of said beam entry area and said beam exit area.
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Specification