Process control monitors for interferometric modulators
First Claim
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1. A method of obtaining information regarding manufacturing processes used to manufacture a micro-electro-mechanical system (MEMS), comprising:
- forming at least one MEMS structure on a first side of a substrate through a series of deposition and patterning steps;
simultaneously forming at least one process control monitor on the first side of the substrate utilizing the series of deposition and patterning steps, wherein the process control monitor has at least one structural difference from the MEMS structure; and
detecting light reflected from the process control monitor from a second side of the substrate opposite the first side, whereby the detected light provides a characteristic of at least one material deposited or removed during the deposition and patterning steps.
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Abstract
Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.
39 Citations
56 Claims
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1. A method of obtaining information regarding manufacturing processes used to manufacture a micro-electro-mechanical system (MEMS), comprising:
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forming at least one MEMS structure on a first side of a substrate through a series of deposition and patterning steps;
simultaneously forming at least one process control monitor on the first side of the substrate utilizing the series of deposition and patterning steps, wherein the process control monitor has at least one structural difference from the MEMS structure; and
detecting light reflected from the process control monitor from a second side of the substrate opposite the first side, whereby the detected light provides a characteristic of at least one material deposited or removed during the deposition and patterning steps. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of monitoring interferometric modulator manufacturing processes, wherein the manufacturing process comprises a series of deposition and patterning steps, the method comprising:
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forming a process control monitor using the series of deposition and patterning steps, wherein the process control monitor has at least one structural difference from interferometric modulators formed by the manufacturing process; and
detecting optical reflectance from the process control monitor. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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- 25. A process control monitor for use in monitoring interferometric modulator manufacturing processes, wherein the interferometric modulators are adapted for use in a display, the process control monitor manufactured by a process comprising at least one step in common with steps used to manufacture the interferometric modulators adapted for use in the display.
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31. A wafer, comprising:
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one or more reflective display elements adapted for use in a display; and
one or more process control monitors adapted to reflect incident light and thereby provide information regarding processes used to manufacture the one or more reflective display elements. - View Dependent Claims (32, 33, 34, 35, 36, 37, 38)
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39. A wafer, comprising:
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a plurality of first means for reflecting light for use in a display; and
second means for monitoring processes used to manufacture the first means. - View Dependent Claims (40, 41, 42, 43, 44)
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45. A display, comprising a first wafer that comprises a plurality of interferometric modulators, wherein the first wafer is produced by a process comprising:
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forming said plurality of interferometric modulators and at least one process control monitor on a second wafer; and
cutting said second wafer to remove the process control monitor and thereby produce said first wafer. - View Dependent Claims (46, 47, 48, 49, 50, 51)
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52. A method of identifying an array of interferometric modulators as suitable for use in a display, wherein the interferometric modulators are manufactured by a process comprising a series of deposition and patterning steps, the method comprising:
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forming at least one process control monitor using at least some of the series of deposition. and patterning steps; and
detecting at least one characteristic of the process control monitor. - View Dependent Claims (53, 54, 55)
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56-176. -176. (canceled)
Specification