Application of in-situ plasma measurements to performance and control of a plasma processing system

• US 20060180570A1
• Filed: 02/10/2006
• Published: 08/17/2006
• Est. Priority Date: 02/14/2005
• Status: Abandoned Application

• Current Assignee: Leonard J. Mahoney
• Original Assignee: Leonard J. Mahoney
• Inventors: Mahoney, Leonard J.
• Application Number:
  US11/352,012
• Publication Number:
  US 20060180570A1
• Time in Patent Office: Days
• US Class Current: 216/59
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01J 37/3299 Feedback systems
• CPC Class Codes: H05H 1/0006 Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature

Abstract

A system and method for managing a plasma system is described. In one embodiment the method includes measuring at least one aspect of a state of plasma in the plasma system so as to obtain plasma state data, receiving subsystem data, which is indicative of at least one subsystem of the plasma system and utilizing both the plasma state data and the subsystem data to manage the plasma system.

Claims

3. The method of claim 3, wherein the plasma state data and the subsystem data provide a determinative amount of system data.

4-1. The method of claim 1 including:

reducing the plasma state data and the subsystem data to a reduced level of data; and

utilizing the reduced level of data to manage the plasma system.