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Application of in-situ plasma measurements to performance and control of a plasma processing system

  • US 20060180570A1
  • Filed: 02/10/2006
  • Published: 08/17/2006
  • Est. Priority Date: 02/14/2005
  • Status: Abandoned Application
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3. The method of claim 3, wherein the plasma state data and the subsystem data provide a determinative amount of system data.

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