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Back-illuminated imaging device and method of fabricating same

  • US 20060186560A1
  • Filed: 02/09/2006
  • Published: 08/24/2006
  • Est. Priority Date: 02/11/2005
  • Status: Active Grant
First Claim
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1. A method for fabricating a back-illuminated semiconductor imaging device, comprising the steps of:

  • growing an epitaxial layer on a substrate, the substrate comprising;

    a mechanical substrate, an insulator layer, and a doped semiconductor substrate, the epitaxial layer being grown on the doped semiconductor substrate, whereby the epitaxial growth process causes dopants from the doped semiconductor substrate to diffuse into the epitaxial layer, and;

    fabricating one or more imaging components in the epitaxial layer.

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