Lithographic apparatus and device manufacturing method

• US 20060187428A1
• Filed: 02/18/2005
• Published: 08/24/2006
• Est. Priority Date: 02/18/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV), Micronic Laser Systems AB (Mycronic AB)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Sandstrom, Tobrjorn, Bleeker, Arno Jan, Hoeks, Martinus Hendricus Hendricus, Kessels, Lambertus Gerardus Maria, Adrianus Franken, Dominicus Jacobus Petrus
• Granted Patent: US 7,460,208 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Abstract

A lithographic apparatus provided with an array of individually controllable elements that is detachably mounted to mounting points on a support frame of the lithographic apparatus.

Claims

1. A lithographic apparatus, comprising:

a support frame having a mounting point; and

an array of individually controllable elements that is used to modulate a beam of radiation, wherein the array of individually controllable elements is detachably mounted to the mounting point on the support frame.

2. The apparatus of claim 1, further comprising:

an actuator system that is associated with the array of individually controllable elements and that controls the position of the array of individually controllable elements relative to the support frame.

3. The apparatus of claim 2, wherein the actuator system controls the position of the array of individually controllable elements in six degrees of freedom.

4. The apparatus of claim 2, wherein the array of individually controllable elements is mounted to the mounting point through use of the associated actuator system, such that the actuator supports the array of individually controllable elements in addition to controlling its position.

5. The apparatus of claim 2, wherein the actuator system is attached to the array of individually controllable elements to form an integral unit that is detachably mounted to the mounting point.

6. The apparatus of claim 5, wherein the actuator system comprises:

three pairs of linearly acting actuators,

wherein each of the actuators is connected at one end to the support frame and at the other end to a support side of the array of individually controllable elements on an opposite side of the array of individually controllable elements than an active side for patterning a beam of radiation,

wherein the pairs of actuators are arranged such that on one of the support frame and the support side of the array of individually controllable elements both actuators of each pair are connected at the same point,

wherein on the other of the support frame and the support side of the array of individually controllable elements the actuators of each pair are connected set apart from each other, and

wherein the separation of the mid point between set apart ends of the actuators of each pair is greater than the separation of connected ends of the pairs of actuators.

7. The apparatus of claim 6, wherein the linearly acting actuators are connected to the array of individually controllable elements and the support frame, such that the linearly acting actuators rotate relative to the array of individually controllable elements and the support frame, respectively.

8. The apparatus of claim 2, further comprising:

a balance mass; and

an associated balance mass actuator,

wherein the balance mass and the associated balance mass actuator provide to the support frame a force that is equal and opposite to the force applied to the support frame by the actuator system.

9. The apparatus of claim 8, wherein the balance mass and balance mass actuator apply force directly to the support frame.

10. The apparatus of claim 8, further comprising:

a plurality of the arrays of individually controllable elements and associated actuator systems,

wherein the balance mass and associated balance mass actuator provide to the support frame a force that is equal and opposite to the sum of the forces applied to the support frame by two or more of the actuator systems.

11. The apparatus of claim 1, further comprising:

a controller that controls the array of individually controllable elements; and

a flexible cable that connects the array of individually controllable elements to the controller to provide control signals.

12. The apparatus of claim 11, wherein the flexible cable is detachably attached to at least one of the controller and the array of individually controllable elements.

13. The apparatus of claim 11, wherein the controller is mounted on the support frame immediately adjacent to the mounting point of the array of individually controllable elements.

14. The apparatus of claim 1, wherein the array of individually controllable elements is comprised of:

a planar plate;

an active device containing the individually controllable elements bonded onto one surface of the planar plate; and

at least one connection point used to mount the array of individually controllable elements on the opposite surface of the planar plate to the surface on which the active device is bonded.

15. The apparatus of claim 14, further comprising:

a cooling element thermally connected to the planar plate of the array of individually controllable elements to form an integral unit that is detachably mounted to the mounting point.

16. The apparatus of claim 14, wherein the planar plate has a fluid conduit within it, and the lithographic apparatus further comprises:

a fluid cooling unit connected to the fluid conduit.

17. The apparatus of claim 16, further comprising:

a flexible fluid conduit that connects the fluid conduit within the array of individually controllable elements to the fluid cooling unit.

18. The apparatus of claim 1, further comprising:

a position sensor system that measures the position of the array of individually controllable elements relative to the support frame.

19. The apparatus of claim 1, further comprising:

a plurality of the arrays of individually controllable elements, each independently detachably mounted to a corresponding one of the mounting point on the support frame;

a common reference frame; and

a position sensor system that measures a position of each of the arrays of individually controllable elements relative to the common reference frame, wherein the position of at least one other component in the lithographic apparatus is measured relative to the common reference frame.

20. The apparatus of claim 1, further comprising:

a plurality of the arrays of individually controllable elements, each independently detachably mounted to a mounting point on the support frame; and

a position sensor system that measures a position of a first one of the plurality of the arrays of individually controllable elements relative to at least a second one of the plurality of the arrays of individually controllable elements within the apparatus.

21. The apparatus of claim 20, wherein the position sensor system comprises:

at least one proximity sensor having a first part on the first one of the plurality of the arrays of individual controllable elements and a second part on the second one of the plurality of the arrays of individually controllable elements.

22. The apparatus of claim 20, wherein:

the first array of individually controllable elements has three mutually non-parallel faces substantially parallel to and adjacent to three corresponding faces on the second array of individually controllable elements;

the sensor system includes a proximity sensor associated with each of the three pairs of corresponding faces, each of the proximity sensors having a first part on one of the faces on the first one of the plurality of the arrays of individually controllable elements and a second part on the corresponding face on the second one of the plurality of the arrays of individually controllable elements.

23. The apparatus of claim 22, wherein the sensor system comprises:

two proximity sensors associated with each of the three pairs of corresponding faces.

24. The apparatus of claim 23, wherein the sensor system comprises:

additional proximity sensors, each of the additional proximity sensors having a first part on a face of the first one of the plurality of the arrays of individually controllable elements and a second part on a substantially parallel, adjacent face on the second one of the plurality of the arrays of individually controllable elements.

25. The apparatus of claim 2, further comprising:

an illumination system that produces the beam of radiation that is modulated by the array of individually controllable elements;

a projection system that projects the modulated beam onto a target portion of a substrate;

a memory containing data representing a telecentricity error of an image formed on the substrate introduced by at least one of the illumination system and the projection system; and

a controller that controls the actuator system to set the position of the array of individually controllable elements such that an overall telecentricity error of the image projected onto the substrate is minimized.

26. The apparatus of claim 1, further comprising:

an illumination system that conditions the beam of radiation, which is modulated by the array of individually controllable elements; and

a projection system that projects the modulated beam of radiation onto a portion of the substrate,

wherein at least one of illumination system, the projection system, and the substrate is wholly or partly mounted to the support frame.

27. A lithographic system, comprising:

a lithographic apparatus including a support frame having a mounting point; and

an array of individually controllable elements that modulates a beam of radiation and that is detachably mounted to the mounting point on the support frame.

28. A device manufacturing method, comprising:

mounting an array of individually controllable elements to a mounting point on a support frame, the mounting point detachably receiving the array of individually controllable elements;

modulating a beam of radiation using the array of individually controllable elements; and

projecting the modulated beam of radiation onto a substrate.

29. A flat panel display manufactured according to the device manufacturing method of claim 28.

30. An integrated circuit device manufactured according to the device manufacturing method of claim 28.

31. A method of preparing a lithographic apparatus for use, comprising:

providing a support frame; and

detachably mounting an array of individually controllable elements to a mounting point on the support frame of the lithographic apparatus.