Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method
First Claim
1. A method of measuring the height-direction position of a mask in an exposure device, the exposure device being configured to emit light from a light source onto the mask and transfer a pattern formed on the mask onto a photosensitive substrate using a projection optical system, the method comprising:
- moving, before measuring the height-direction position of the mask, an exposure area defining member placed between the mask and the projection optical system, the exposure area defining member defining an exposure area; and
measuring the height-direction position of the mask.
1 Assignment
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Accused Products
Abstract
A method to measure the height-direction position of a mask M in an exposure device having a function to irradiate the mask M with light emitted from a light source and transfer a pattern formed on the mask M onto a photosensitive substrate such as a wafer by a projection optical system, a mask surface height-direction position measurement method characterized by moving, before measuring the height-direction position of the mask M, an exposure area defining member 1 which is arranged between the mask M and the projection optical system and defines an exposure area at the time of exposure.
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Citations
21 Claims
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1. A method of measuring the height-direction position of a mask in an exposure device, the exposure device being configured to emit light from a light source onto the mask and transfer a pattern formed on the mask onto a photosensitive substrate using a projection optical system, the method comprising:
- moving, before measuring the height-direction position of the mask, an exposure area defining member placed between the mask and the projection optical system, the exposure area defining member defining an exposure area; and
measuring the height-direction position of the mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 18, 19)
- moving, before measuring the height-direction position of the mask, an exposure area defining member placed between the mask and the projection optical system, the exposure area defining member defining an exposure area; and
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12. A method of measuring the height-direction position of a mask in an exposure device, the exposure device being configured to emit light from a light source onto the mask and transfer a pattern formed on the mask onto a photosensitive substrate using a projection optical system, the method comprising:
- providing a mask stage height position measurement device to measure the height-direction position of a mask stage which holds the mask, and obtaining the height-direction position of the mask surface from data measured by the mask stage height position measurement device.
- View Dependent Claims (20)
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13. A method of measuring the height-direction position of a mask surface from a reference plane by a height measurement device in an exposure device, the exposure device being configured to emit light from a light source onto the mask and transfer a pattern formed on the mask onto a photosensitive substrate using a projection optical system, the method comprising:
- providing an exposure area defining member for defining an exposure area at the time of exposure, and measuring the height-direction position of the mask surface at a position in which a height measurement device is not obstructed by the exposure area defining member.
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14. (canceled)
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15. (canceled)
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16. An exposure device for exposing a photosensitive substrate with a reflection mask pattern, comprising:
- a projection optical system for projecting the reflection mask pattern, a measurement means for measuring the height-direction position of the reflection mask, a measurement means for measuring the height-direction position of the photosensitive substrate, a means for adjusting the height-direction position of the reflection mask based on the measured height-direction position of the reflection mask, and a means for adjusting the height-direction position of the photosensitive substrate based on the measured height-direction position of the photosensitive substrate.
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17. An exposure device for exposing a mask with light emitted from a light source and for transferring a pattern formed on the mask onto a photosensitive substrate, comprising:
- a projection optical system, height-direction position measurement means for measuring the height-direction position of the mask, an exposure area defining member which is provided between the mask and the projection optical system for defining an exposure area, a movement means for moving the exposure area defining member, and a control means for controlling the movement means so as to fix the exposure area defining member at the time of exposure and move the exposure area defining member at the time of measuring the height-direction position.
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21. A method of exposing a photosensitive substrate with a pattern on a mask, the method comprising:
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moving an exposure area defining member;
measuring a height-direction position of the mask after moving the exposure area defining member;
correcting the height-direction position of the mask based on the measured height-direction position data of the mask;
emitting light onto the mask in a corrected height-direction position; and
transferring the pattern on the mask to the photosensitive substrate.
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Specification