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Processing information management in a plasma processing tool

  • US 20060187713A1
  • Filed: 02/18/2005
  • Published: 08/24/2006
  • Est. Priority Date: 02/18/2005
  • Status: Active Grant
First Claim
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1. In a substrate processing environment, a computer-implemented method for managing substrate processing data, said substrate process data being acquired while a substrate is processed in a plasma-processing chamber of a cluster tool, comprising:

  • receiving meta-data that identifies at least one of an identification of said substrate and a process receiving from a plurality of transducers a plurality of process data streams, each of said plurality of process data streams pertaining to a process parameter being monitored, individual data items in each of said plurality of process data streams being collected in accordance to one of a first methodology and a second methodology, said first methodology representing data collection that is periodic in time, said second methodology representing data collection that takes place when predefined events occur; and

    storing said individual data items associated with said plurality of process data streams in a single file, said single file storing only said substrate process data pertaining to a single recipe that is employed to process said substrate.

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