×

Method and apparatus for determining an improved assist feature configuration in a mask layout

  • US 20060188673A1
  • Filed: 04/19/2005
  • Published: 08/24/2006
  • Est. Priority Date: 02/24/2005
  • Status: Active Grant
First Claim
Patent Images

1. A method for determining an assist feature configuration which specifies locations and dimensions for one or more assist features in a mask layout, the method comprising:

  • receiving a mask layout;

    creating a set of candidate assist feature configurations; and

    determining an improved assist feature configuration using the set of candidate assist feature configurations and a process-sensitivity model which can be represented by a multidimensional function that captures process-sensitivity information;

    wherein placing assist features in the mask layout based on the improved assist feature configuration improves the manufacturability of the mask layout;

    wherein using the process-sensitivity model to determine the improved assist feature configuration reduces the computational time required to determine the improved assist feature configuration in the mask layout.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×