Method and apparatus for determining an improved assist feature configuration in a mask layout
First Claim
1. A method for determining an assist feature configuration which specifies locations and dimensions for one or more assist features in a mask layout, the method comprising:
- receiving a mask layout;
creating a set of candidate assist feature configurations; and
determining an improved assist feature configuration using the set of candidate assist feature configurations and a process-sensitivity model which can be represented by a multidimensional function that captures process-sensitivity information;
wherein placing assist features in the mask layout based on the improved assist feature configuration improves the manufacturability of the mask layout;
wherein using the process-sensitivity model to determine the improved assist feature configuration reduces the computational time required to determine the improved assist feature configuration in the mask layout.
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Abstract
One embodiment of the present invention provides a system that determines the locations and dimensions of one or more assist features in an uncorrected or corrected mask layout. During operation, the system receives a mask layout. The system then creates a set of candidate assist feature configurations, which specify locations and sizes for one or more assist features in the mask layout. Next, the system determines an improved assist feature configuration using the set of candidate assist feature configurations and a process-sensitivity model which can be represented by a multidimensional function that captures process-sensitivity information. Note that placing assist features in the mask layout based on the improved assist feature configuration improves the manufacturability of the mask layout. Moreover, using the process-sensitivity model to determine the improved assist feature configuration reduces the computational time required to determine the improved assist feature configuration in the mask layout.
61 Citations
20 Claims
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1. A method for determining an assist feature configuration which specifies locations and dimensions for one or more assist features in a mask layout, the method comprising:
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receiving a mask layout;
creating a set of candidate assist feature configurations; and
determining an improved assist feature configuration using the set of candidate assist feature configurations and a process-sensitivity model which can be represented by a multidimensional function that captures process-sensitivity information;
wherein placing assist features in the mask layout based on the improved assist feature configuration improves the manufacturability of the mask layout;
wherein using the process-sensitivity model to determine the improved assist feature configuration reduces the computational time required to determine the improved assist feature configuration in the mask layout. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A computer-readable storage medium storing instructions that when executed by a computer cause the computer to perform a method for determining an assist feature configuration which specifies locations and dimensions for one or more assist features in a mask layout, the method comprising:
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receiving a mask layout;
creating a set of candidate assist feature configurations; and
determining an improved assist feature configuration using the set of candidate assist feature configurations and a process-sensitivity model which can be represented by a multidimensional function that captures process-sensitivity information;
wherein placing assist features in the mask layout based on the improved assist feature configuration improves the manufacturability of the mask layout;
wherein using the process-sensitivity model to determine the improved assist feature configuration reduces the computational time required to determine the improved assist feature configuration in the mask layout. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A method for determining assist feature dimensions for one or more assist features located in a 2-D region in a mask layout, the method comprising:
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receiving a set of assist features located in a 2-D region in a mask layout;
creating a set of candidate assist feature configurations, wherein an assist feature configuration specifies dimensions for one or more assist features; and
determining an improved assist feature configuration using the set of candidate assist feature configurations and a process model that models one or more semiconductor manufacturing processes;
wherein dimensioning assist features in the mask layout based on the improved assist feature configuration improves the manufacturability of the 2-D region in the mask layout. - View Dependent Claims (16, 17)
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18. A computer-readable storage medium storing instructions that when executed cause the computer to perform a method for determining assist feature dimensions for one or more assist features located in a 2-D region in a mask layout, the method comprising:
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receiving a set of assist features located in a 2-D region in a mask layout;
creating a set of candidate assist feature configurations, wherein an assist feature configuration specifies dimensions for one or more assist features; and
determining an improved assist feature configuration using the set of candidate assist feature configurations and a process model that models one or more semiconductor manufacturing processes;
wherein dimensioning assist features in the mask layout based on the improved assist feature configuration improves the manufacturability of the 2-D region in the mask layout. - View Dependent Claims (19, 20)
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Specification