Surface treatment apparatus

• US 20060191479A1
• Filed: 10/19/2005
• Published: 08/31/2006
• Est. Priority Date: 07/09/1998
• Status: Abandoned Application

• Current Assignee: Hiroyuki Mizukami, Masayuki Takashiri, Toshihiro Tabuchi, Yasumasa Toyoshima
• Original Assignee: Hiroyuki Mizukami, Masayuki Takashiri, Toshihiro Tabuchi, Yasumasa Toyoshima
• Inventors: Toyoshima, Yasumasa, Tabuchi, Toshihiro, Mizukami, Hiroyuki, Takashiri, Masayuki
• Application Number:
  US11/254,072
• Publication Number:
  US 20060191479A1
• Time in Patent Office: Days
• US Class Current: 118/723.00E
• CPC Class Codes: A63B 2102/32 Golf
• CPC Class Codes: C23C 16/45563 Gas nozzles
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/509 using internal electrodes
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream

Abstract

The present invention has an object to provide a surface treatment apparatus, which can form a high-quality film at a high speed while preventing deterioration of the film due to collisions of charged particles.

The surface treatment apparatus (1) of the present invention comprises a casing (2) partitioned to two chambers, that is, a plasma generating chamber (3) provided with plasma generating electrodes (5, 5′) and a substrate processing chamber (4) provided with a substrate supporting table (8). A plasma vent (6) is formed in the electrode (5′) that composes the partition between the chambers (3, 4). A conductive mesh-shaped sheet (9) is disposed in a direction across the plasma between the plasma vent (6) and a substrate (S) on the substrate supporting table (8). The sheet (9), to which a variable bias is applied, captures charged particles in the plasma so that the charged particles can be excluded from the plasma.

Claims

1-12. -12. (canceled)

13. A surface treatment apparatus for generating plasma by a plasma generating electrode in a casing having said plasma generating electrode, a raw-gas inlet and a substance supporting table, plasma ionizing the raw gas and plasma processing a surface of said substrate, which is mounted on said substrate supporting table;

wherein

said casing is partitioned to two chambers, that is, a plasma generating chamber provided with said plasma generating electrode and a substrate processing chamber provided with said substrate supporting table, said plasma generating electrode separates the plasma generating chamber from the substrate processing chamber;

said substrate processing chamber communicates with said plasma generating chamber through at least one plasma vent which is formed at said plasma generating electrode; and

electrodes disposed in pair so as to be opposed to each other interposing a plasma flow spurted out from the plasma vent or said electrode in an orifice shape concentrically disposed beneath the plasma vent are/is provided in and between the vicinity of said plasma vent and the vicinity of said substrate supporting table.

14. A surface treatment apparatus according to claim 13, wherein high frequency electric power is inputted to said plasma electrode.

15. A surface treatment apparatus according to claim 13, wherein said plasma vent has a required orifice shape or a nozzle shape.

16. A surface treatment apparatus according to claim 13, wherein said raw-gas inlet defines an opening on a side face of said plasma vent.

17. A surface treatment apparatus according to claim 13, wherein said plasma vent has a circular section.

18. A surface treatment apparatus according to claim 13, wherein said plasma vent has a slit shape.

19. A surface treatment apparatus according to claim 13, wherein said substrate is given with electric potential.