Correction of optical proximity effects by intensity modulation of an illumination arrangement

• US 20060192935A1
• Filed: 02/14/2006
• Published: 08/31/2006
• Est. Priority Date: 02/11/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Colina, Luis Alberto Colina Santamaria, Hansen, Steven George, Finders, Jozef Maria
• Granted Patent: US 7,471,375 B2
• Time in Patent Office: Days
• US Class Current: 355/69
• CPC Class Codes: G03F 7/70108 Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Abstract

A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus is presented. The method includes adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, and illuminating the patterning device pattern with the first and second illumination shapes.

Claims

1. A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus, the method comprising:

adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, and

illuminating the patterning device pattern with the first and second illumination shapes.

2. The method of claim 1, wherein the adjusting includes adjusting the intensity of the first illumination shape relative to the second illumination shape such that the intensity of the radiation beam radiated from the first illumination area is different from the intensity of the radiation beam radiated from the second illumination area.

3. The method of claim 1, wherein the first and the second illumination areas each define a local area of a continuous illumination shape and wherein the adjusting includes adjusting the intensity of the first illumination shape relative to the second illumination shape so as to produce a substantially homogeneous intensity within the continuous illumination shape.

4. The method of claim 3, wherein the continuous illumination shape is an annular illumination.

5. The method of claim 1, wherein the adjusting includes selecting an intensity ratio between the first illumination shape and the second illumination shape so as to reduce optical proximity effects due to the patterning device pattern.

6. The method of claim 1, wherein the adjusting includes selecting an intensity ratio between the first illumination shape and the second illumination shape such that an image of the patterning device pattern obtained with the lithographic apparatus is substantially the same as an image of the patterning device pattern obtained with another lithographic apparatus.

7. The method of claim 1, wherein the adjusting includes using a filter in the illumination system to adjust the intensity of the radiation beam radiated from the first illumination area.

8. The method of claim 7, wherein the filter includes a plurality of blades that are movable into and out of a path of the radiation beam.

9. The method of claim 1, further comprising using a first optical element and a second optical element to produce respectively the first and second illumination shapes and wherein the adjusting includes adjusting a power of the radiation beam that impinges on the first optical element.

10. The method of claim 9, wherein the first and second optical elements are diffractive optical elements.

11. A lithographic projection apparatus, comprising:

an illumination system configured to condition a beam of radiation, the illumination system configured to produce a first illumination shape and a second illumination shape, the first and second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of the illumination system, and configured to adjust an intensity of the first illumination shape relative to the second illumination shape while maintaining the first and second illumination areas substantially constant;

a support structure configured to hold a patterning structure configured to pattern the beam of radiation according to a desired pattern; and

a projection system configured to project the beam of radiation onto a target portion of a substrate.

12. The apparatus of claim 11, wherein the illumination system includes a filter configured to adjust the intensity of the radiation beam radiated from the first illumination area.

13. The apparatus of claim 12, wherein the filter includes a plurality of blades that are movable into and out of a path of the radiation beam.

14. The apparatus of claim 11, wherein the illumination system includes a first optical element and a second optical element that are configured to produce respectively the first and the second illumination shapes and the illumination system is constructed and arranged to adjust a power of the radiation beam that impinges on the first optical element.

15. The apparatus of claim 14, wherein the first and second optical elements are diffractive optical elements.

16. A method of configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus, the method comprising:

determining an intensity ratio between a first illumination shape and a second illumination shape that substantially reduces an optical proximity effect due to the patterning device pattern, the first and second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus; and

based on the intensity ratio, adjusting an intensity of the first illumination shape relative to the second illumination shape while maintaining the first and second illumination areas substantially constant.

17. The method of claim 16, wherein the adjusting includes using a filter in the illumination system to adjust the intensity of the radiation beam radiated from the first illumination area.

18. The method of claim 17, wherein the filter includes a plurality of blades that are movable into and out of a path of the radiation beam.

19. The method of claim 16, further comprising using a first optical element and a second optical element to produce respectively the first and second illumination shapes and wherein the adjusting includes adjusting a power of the radiation beam that impinges on the first optical element.

20. The method of claim 19, wherein the first and second optical elements are diffractive optical elements.

21. A machine readable medium encoded with machine executable instructions for performing a method of configuring optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus, the method comprising:

determining an intensity ratio between a first illumination shape and a second illumination shape that substantially reduces an optical proximity effect due to the patterning device pattern, the first and second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus; and

based on the intensity ratio, adjusting an intensity of the first illumination shape relative to the second illumination shape while maintaining the first and second illumination areas substantially constant.

22. The medium of claim 21, wherein the adjusting includes using a filter in the illumination system to adjust the intensity of the radiation beam radiated from the first illumination area.

23. The medium of claim 22, wherein the filter includes a plurality of blades that are movable into and out of a path of the radiation beam.

24. The medium of claim 21, further comprising using a first optical element and a second optical element to produce respectively the first and second illumination shapes and wherein the adjusting includes adjusting a power of the radiation beam that impinges on the first optical element.

25. The medium of claim 24, wherein the first and second optical elements are diffractive optical elements.