Electrophotographic photosensitive member
First Claim
1. An electrophotographic photosensitive member comprising:
- a conductive substrate;
a photoconductive layer composed of a non-single-crystal silicon film using at least a silicon atom as a base material, the photoconductive layer being superimposed on the conductive substrate; and
a surface region layer composed of a non-single-crystal silicon nitride film which uses a silicon atom and a nitrogen atom as base materials and at least part of which contains a Group 13 element in the periodic table, the surface region layer being superimposed on the photoconductive layer, wherein a content of the Group 13 element with respect to a total amount of constituent atoms has a distribution having at least two local maximum values in a thickness direction of the surface region layer.
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Accused Products
Abstract
An electrophotographic photosensitive member is provided in which electrophotographic properties including resolving power have been improved with minimized absorption of image exposure light at a short wavelength in a surface layer. The electrophotographic photosensitive member includes a photoconductive layer composed of a non-single-crystal silicon film and a surface region layer composed of a non-single-crystal silicon nitride film containing silicon atoms and nitrogen atoms, superimposed on a conductive substrate. The surface region layer has a gradient-composition layer in which the composition ratio between silicon atoms and nitrogen atoms is changed and a surface layer in which the composition ratio between them is constant. The gradient-composition layer and surface region layer contain a Group 13 element, and the content distribution of the element in the thickness direction of each layer has at least one local maximum value.
17 Citations
24 Claims
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1. An electrophotographic photosensitive member comprising:
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a conductive substrate;
a photoconductive layer composed of a non-single-crystal silicon film using at least a silicon atom as a base material, the photoconductive layer being superimposed on the conductive substrate; and
a surface region layer composed of a non-single-crystal silicon nitride film which uses a silicon atom and a nitrogen atom as base materials and at least part of which contains a Group 13 element in the periodic table, the surface region layer being superimposed on the photoconductive layer, wherein a content of the Group 13 element with respect to a total amount of constituent atoms has a distribution having at least two local maximum values in a thickness direction of the surface region layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. An electrophotographic photosensitive member comprising:
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a conductive substrate;
a photoconductive layer composed of a non-single-crystal silicon film using at least a silicon atom as a base material, the photoconductive layer being superimposed on the conductive substrate; and
a surface region layer composed of a non-single-crystal silicon nitride film which uses a silicon atom and a nitrogen atom as base materials and at least part of which contains a Group 13 element in the periodic table, the surface region layer being superimposed on the photoconductive layer, the surface region layer having a gradient-composition layer in which a composition ratio between silicon atoms and nitrogen atoms is changed and a surface layer in which a composition ratio between silicon atoms and nitrogen atoms is constant, wherein a content of the Group 13 element with respect to a total amount of constituent atoms has distribution with at least one local maximum value in a thickness direction of the gradient-composition layer and has distribution with at least one local maximum value in the thickness direction of the surface layer. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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Specification