Horizontal emitting, vertical emitting, beam shaped, distributed feedback (DFB) lasers by growth over a patterned substrate
First Claim
1. A structure using integrated optical elements, comprising:
- (a) a substrate;
(b) a buffer layer grown on the substrate;
(c) one or more patterned layers deposited on top of the buffer layer, wherein each of the patterned layers is comprised of a mask and materials filling holes in the mask; and
(d) one or more active layers formed on or between the patterned layers;
(e) wherein each patterned layer acts as a mirror, optical confinement layer, grating, wavelength selective element, beam shaping element or beam directing element for the active layers.
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Abstract
A structure using integrated optical elements is comprised of a substrate, a buffer layer grown on the substrate, one or more patterned layers formed on the buffer layer and one or more active layers formed on or between the patterned layers, for instance by Lateral Epitaxial Overgrowth (LEO), and including one or more light emitting species. The patterned layer comprises a mask (made of insulating, semiconducting or metallic material) and material filling holes in the mask. The patterned layer, due to a large index difference with the active layer and/or variations of a refractive index between the mask and materials filling holes in the mask, acts as an optical confinement layer, a mirror, a diffraction grating, a wavelength selective element, a beam shaping element or a beam directing element.
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Citations
35 Claims
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1. A structure using integrated optical elements, comprising:
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(a) a substrate;
(b) a buffer layer grown on the substrate;
(c) one or more patterned layers deposited on top of the buffer layer, wherein each of the patterned layers is comprised of a mask and materials filling holes in the mask; and
(d) one or more active layers formed on or between the patterned layers;
(e) wherein each patterned layer acts as a mirror, optical confinement layer, grating, wavelength selective element, beam shaping element or beam directing element for the active layers. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method of fabricating a structure using integrated optical elements, comprising:
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(a) growing a buffer layer on a substrate;
(b) depositing one or more patterned layers on top of the buffer layer, wherein each of the patterned layers is comprised of a mask and materials filling holes in the mask; and
(c) forming one or several active layers on or between the patterned layers;
(d) wherein each patterned layer acts as a mirror, optical confinement layer, grating, wavelength selective element, beam shaping element or beam directing element for the active layers. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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Specification