×

Gas baffle and distributor for semiconductor processing chamber

  • US 20060196603A1
  • Filed: 03/07/2005
  • Published: 09/07/2006
  • Est. Priority Date: 03/07/2005
  • Status: Active Grant
First Claim
Patent Images

1. A gas distributor for use in a processing chamber, the gas distributor comprising:

  • a body including a baffle having an upper surface adapted to outwardly direct gas away from the body and a lower surface opposite the upper surface, the lower surface having a central portion and a recessed peripheral portion separated from the central portion by a step surface, the body further including a gas inlet, a plurality of gas outlets disposed in the step surface, and a gas passage connecting the inlet to the plurality of gas outlets.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×