Gas baffle and distributor for semiconductor processing chamber

• US 20060196603A1
• Filed: 03/07/2005
• Published: 09/07/2006
• Est. Priority Date: 03/07/2005
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Victor Wang, Yen-Kun, Lei, Lawrence Chung-Lai, Bang, Won B., Sun, David P., Lu, Siqing, Gianoulakis, Steven E.
• Granted Patent: US 7,722,719 B2
• Time in Patent Office: Days
• US Class Current: 156/345.33
• CPC Class Codes: H01J 2237/3321 CVD [Chemical Vapor Deposition]
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow

Abstract

Techniques of the present invention are directed to distribution of deposition gases onto a substrate. In one embodiment, a gas distributor for use in a processing chamber is provided. The gas distributor includes a body having a gas deflecting surface and a gas distributor face. The gas deflecting surface defines a cleaning gas pathway. The gas distributor face is disposed on an opposite side of the body from the gas deflecting surface and faces toward a substrate support member. The gas distributor face includes a raised step and at least one set of apertures through the raised step. The at least one set of apertures are adapted to distribute a deposition gas over a substrate positioned on the substrate support member.

Claims

1. A gas distributor for use in a processing chamber, the gas distributor comprising:

a body including a baffle having an upper surface adapted to outwardly direct gas away from the body and a lower surface opposite the upper surface, the lower surface having a central portion and a recessed peripheral portion separated from the central portion by a step surface, the body further including a gas inlet, a plurality of gas outlets disposed in the step surface, and a gas passage connecting the inlet to the plurality of gas outlets.

2. A gas distributor of claim 1 further comprising a sleeve disposed around a portion of the body defines an annular gas passageway adapted to direct gas towards baffle upper surface.

3. The gas distributor of claim 1 wherein the gas distributor is a single piece.

4. The gas distributor of claim 1 wherein the gas distributor comprises at least one of aluminum oxide, aluminum nitride, sapphire and silicon carbide.

5. The gas distributor of claim 1 wherein the step surface forms an oval on the lower surface, and the plurality of gas outlets are evenly distributed around the step surface.

6. The gas distributor of claim 5 herein the oval is a circle.

7. The gas distributor of claim 1 wherein the plurality of gas outlets and the step surface are sloped at about the same angle.

8. The gas distributor of claim 1 herein the upper surface is a curved to direct a cleaning gas towards a wall of the chamber.

9. The gas distributor of claim 1 wherein the upper surface is a curved to divert a cleaning gas away from the substrate support member.

10. The gas distributor of claim 1 wherein a slope of the step surface is in a range of about 90 degrees to about 180 degrees.

11. The gas distributor of claim 1 wherein the deposition gas comprises a silane.

12. The gas distributor of claim 1 wherein each of the plurality of gas outlets are in a range of about 90 degrees to about 20 degrees to the riser.

13. The gas distributor of claim 1 further comprising at least one clean gas passageway extending between the upper and lower surfaces.

14. The gas distributor of claim 1 wherein the plurality of gas outlets includes at least eight apertures.

15. The apparatus of claim 1 wherein the gas distributor further comprises a second step surface and at least a second plurality of gas outlets through the second step surface.

16. A substrate processing chamber, the chamber comprising:

an enclosure having a ceiling and a sidewall;

a substrate support capable of supporting a substrate;

a gas distributor positioned centrally above the substrate support, the gas distributor comprising a body including a baffle having an upper surface adapted to outwardly direct gas away from the body and towards the enclosure sidewall, a lower surface opposite the upper surface and spaced apart from the substrate support, the lower surface have central portion and a recessed peripheral portion separated from the central portion by a step surface, the body further including a gas inlet, a plurality of gas outlets disposed in the step surface, and a gas passage connecting the inlet to the plurality of gas outlets.

17. A gas distributor of claim 16 further comprising a sleeve disposed around a portion of the body defines an annular gas passageway adapted to direct gas towards baffle upper surface.

18. The gas distributor of claim 16 wherein the gas distributor is a single piece.

19. The gas distributor of claim 16 wherein the gas distributor comprises at least one of aluminum oxide or aluminum nitride.

20. The gas distributor of claim 16 wherein the step surface forms an oval on the lower surface, and the plurality of gas outlets are evenly distributed around the step surface.

21. The gas distributor of claim 20 herein the oval is a circle.

22. The gas distributor of claim 16 wherein the plurality of gas outlets and the step surface are sloped at about the same angle.

23. The gas distributor of claim 16 herein the upper surface is a curved to direct a cleaning gas towards a wall of the chamber.

24. The gas distributor of claim 16 wherein the upper surface is a curved to divert a cleaning gas away from the substrate support member.

25. The gas distributor of claim 16 wherein a slope of the step surface is in a range of about 90 degrees to about 180 degrees.

26. The gas distributor of claim 16 wherein the deposition gas comprises a silane.

27. The gas distributor of claim 16 wherein each of the plurality of gas outlets are in a range of about 90 degrees to about 15 degrees to the riser.

28. The gas distributor of claim 16 further comprising at least one clean gas passageway extending between the upper and lower surfaces.

29. The gas distributor of claim 16 wherein the plurality of gas outlets includes at least eight apertures.

30. The apparatus of claim 16 wherein the gas distributor further comprises a second step surface and at least a second plurality of gas outlets through the second step surface.