Polishing pad, process for producing the same and method of polishing therewith
First Claim
1. A polishing pad comprising a fiber including organic fiber and a matrix resin holding the fiber, wherein at least the organic fiber is exposed on the work material-side surface thereof.
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Abstract
Provided is a polishing pad comprising a fiber including organic fiber and a matrix resin holding the fiber, wherein at least the organic fiber is exposed on the work material-side surface thereof at least after dressing. The polishing pad suppresses generation of minute polishing scratches on the work material and allows flat polishing at low load. It in also possible to manage the polishing end point of the work material without generation of polishing scratch with its optical detection system monitoring the polishing state of work material. Thus, for example, it is possible to polish substrates under a small load on the interlayer insulating film and give products superior in flatness in semiconductor device manufacturing processes and thus, the polishing pad according to the invention may be used easily in the next-generation dual damascene method.
47 Citations
24 Claims
- 1. A polishing pad comprising a fiber including organic fiber and a matrix resin holding the fiber, wherein at least the organic fiber is exposed on the work material-side surface thereof.
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2. A polishing pad comprising a fiber including organic fiber and a matrix resin holding the fiber, wherein at least the organic fiber is exposed on the work material-side surface after dressing treatment.
- 19. A method for producing a polishing pad for use as attached to a polishing table for flattening a work material'"'"'s polishing plane, comprising a step of obtaining a mixture of a fiber including organic fiber and a matrix composition containing a thermoplastic resin by blending, a step of palletizing or tabletizing the mixture, and a step of molding the pellet or tablet into a plate or a sheet shape by extrusion or injection molding.
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20. A method for producing a polishing pad for use as attached to a polishing table for flattening a work material'"'"'s polishing plane, comprising a step of impregnating a fibrous base material containing organic fiber with a matrix resin composition to form a fibrous resin-impregnated sheet-shaped base material. and a step of laminating fibrous sheet-shaped base materials including the fibrous resin-impregnated sheet-shaped base material and molding the laminate with heating and pressure.
Specification