INCREASED LIGHT EXTRACTION FROM A NITRIDE LED
First Claim
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1. A method for fabricating a light emitting device comprising:
- depositing epitaxial layers on a growth substrate to produce an epitaxial wafer;
fabricating a plurality of light emitting diode devices with a lateral current flow geometry on the epitaxial wafer;
dicing the epitaxial wafer to generate a plurality of light emitting dies;
flip chip bonding at least one electrode of one or more die to at least one bonding pad of a mount;
subsequent to bonding of the dies, removing the growth substrate to expose an epitaxial layer; and
roughening the epitaxial layer by electrode-less photochemical etching.
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Abstract
In a method for fabricating a flip-chip light emitting diode device, a submount wafer is populated with a plurality of the light emitting diode dies. Each device die is flip-chip bonded to the submount. Subsequent to the flip-chip bonding, a growth substrate is removed. The entire submount is immersed in the etchant solution, exposed to the light for a prespecified period of time, removed from the solution, dried and diced into a plurality of LEDs., The LEDs are immediately packaged without any further processing.
90 Citations
15 Claims
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1. A method for fabricating a light emitting device comprising:
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depositing epitaxial layers on a growth substrate to produce an epitaxial wafer;
fabricating a plurality of light emitting diode devices with a lateral current flow geometry on the epitaxial wafer;
dicing the epitaxial wafer to generate a plurality of light emitting dies;
flip chip bonding at least one electrode of one or more die to at least one bonding pad of a mount;
subsequent to bonding of the dies, removing the growth substrate to expose an epitaxial layer; and
roughening the epitaxial layer by electrode-less photochemical etching. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method for fabricating a Group III Nitride semiconductor lateral current light emitting diode device comprising:
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depositing epitaxial layers on a growth substrate to produce an epitaxial wafer;
fabricating a plurality of light emitting diode devices on the epitaxial wafer;
dicing the epitaxial wafer to generate a plurality of light emitting diode device dies, each including laterally disposed first and second electrodes;
flip chip bonding the device dies to a mount, the flip chip bonding including securing the device dies to the mount by bonding the first and second electrodes of each device die to corresponding bonding pads of the mount;
subsequent to the flip chip bonding of the device dies, removing the growth substrate to expose an epitaxial layer;
roughening the exposed epitaxial layer being exposed by the substrate removal by electrode-less photochemical etching without applying a bias, including;
immersing the mount, carrying the device dies, in a chemical solution for a prespecified time period, and concurrently illuminating the immersed exposed epitaxial layer with a light source;
removing the mount carrying the device dies from the chemical solution;
rinsing the mount carrying the device dies;
drying the mount carrying the device dies;
dicing the mount to generate a plurality of light emitting diode chips; and
packaging the light emitting diode chips.
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15-19. -19. (canceled)
Specification