Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping

• US 20060203220A1
• Filed: 10/19/2005
• Published: 09/14/2006
• Est. Priority Date: 03/14/2005
• Status: Active Grant

• Current Assignee: ASML Holding NV, ASML Netherlands BV (ASML Holding NV), Avago Technologies International Sales Pte Limited (Broadcom, Inc.)
• Original Assignee: ASML Holding NV, ASML Netherlands BV (ASML Holding NV), LSI Logic Corporation (Broadcom, Inc.)
• Inventors: Baselmans, Johannes Jacobus Matheus, Bleeker, Arno Jan, Troost, Kars Zeger, Callan, Neal, Eib, Nicholas K., Markoya, Louis
• Granted Patent: US 7,499,146 B2
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Abstract

The tilt and position of individually controllable element are simultaneously adjusted to allow a greater range of contrasts to be achieved. This can also be used to compensate for cupping of individually controllable elements. Simultaneous adjustment of both the position and tilt of the individually controllable elements can be achieved by two electrodes operable over a range of values.

Claims

1. A lithographic apparatus, comprising:

an illumination system that conditions a radiation beam;

a patterning array comprising individually controllable elements that modulate the radiation beam and an adjusting device that simultaneously adjusts a linear position and tilt of each of the individually controllable elements; and

a projection system that projects the modulated beam onto a target portion of a substrate.

2. The lithographic apparatus of claim 1, wherein the linear position of the individually controllable elements is adjustable in a direction perpendicular to a plane in which the array of individually controllable elements lies.

3. The lithographic apparatus of either claim 1, wherein the adjusting device has a range of linear position adjustments of at least a wavelength λ

of the beam of radiation.

4. The lithographic apparatus of claim 1, wherein the adjusting device has a range of tilt adjustment of an angle range of at least 3λ

/2Lrad, wherein L is a length of the individually controllable element and λ

is a wavelength of the beam of radiation.

5. The lithographic apparatus of claim 1, wherein the adjusting device also simultaneously adjusts a linear position linearly in range of λ

, a wavelength of the beam of radiation, and adjusts the tilt over an angle range of λ

/Lrad.

6. The lithographic apparatus of claim 1 wherein a single control signal controls the adjusting device, such as to maximize a range of intensities generated by each of the individually controllable elements.

7. The lithographic apparatus of claim 1, wherein:

the individually controllable elements each comprise a hinge line that lies in a plane of the individually controllable element, the hinge line dividing the individually controllable element into two parts; and

the apparatus further comprises two electrodes, each of the electrodes arranged to adjust the tilt of the individually controllable element over a range of at least three values and each of the electrodes being arranged opposite a different part of the individually controllable element.

8. The lithographic apparatus of claim 7, wherein both of the electrodes are positioned opposite a same face of the individually controllable element.

9. The lithographic apparatus of claim 7, further comprising:

a memory that stores compensating values applied to the adjusting device to compensate for each degree of non-planarity of the individually controllable element by changing the linear position of the individually controllable element using the electrodes.

10. The lithographic apparatus of claim 1, wherein at least one individually controllable element comprises a hinge line in the plane of the individually controllable element, a portion of the individually controllable element being removed along the hinge line.

11. The lithographic apparatus of claim 1, wherein:

the individually controllable element comprises a hinge in the plane of the individually controllable element; and

the lithographic apparatus further comprises an electrode that controls the position of the hinge.

12. The lithographic apparatus of claim 1, further comprising two electrodes, one of the electrodes being arranged to adjust the tilt of the individually controllable element over a range of at least three values, each electrode being arranged opposite a different part of the individually controllable element.

13. The lithographic apparatus of claim 1, wherein:

the individually controllable elements each comprise a hinge line in the plane of the individually controllable element, the hinge line dividing the individually controllable element into two parts; and

the apparatus further comprises two electrodes, each arranged to adjust the tilt of the individually controllable element over a range of at least three values, each electrode being arrange opposite a different part of the individually controllable element.

14. A patterning array, comprising:

individually controllable elements that modulate a radiation beam; and

an adjusting device constructed to simultaneously adjust a linear position and tilt of each of the individually controllable elements.

15. The patterning array of claim 14, wherein:

the individually controllable elements each comprise a hinge line in a plane of the individually controllable element, the hinge line dividing the individually controllable element into two parts; and

the apparatus further comprises two electrodes, each of the two electrodes adjust the tilt of the individually controllable element over a range of at least three values, and each of the two electrodes being arranged opposite a different part of the individually controllable element.

16. The patterning array of claim 14, wherein at least one of the individually controllable elements comprise a hinge line in a plane of the individually controllable element, a portion of the individually controllable element being removed along the hinge line.

17. A device manufacturing method, comprising:

modulating a beam of radiation using an array of individually controllable elements;

projecting the modulated beam of radiation onto a substrate; and

simultaneously adjusting a position and tilt of each of the individually controllable elements.

18. The method of claim 17, wherein the position and tilt of each of the individually controllable elements are adjusted using two electrodes, each of the two electrodes being operable over a range of values.

19. An integrated circuit manufactured according to the method of claim 17.

20. A flat panel display manufactured according to the method of claim 17.