Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume
First Claim
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1. A method, comprises:
- storing data representing a pattern for programming an array of individually controllable elements that modulate a beam;
dividing the pattern into a plurality of regions;
assigning an identifier corresponding to a portion of the pattern to each of the plurality of regions; and
storing the portion of the pattern corresponding to each unique identifier.
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Abstract
A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method comprises generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.
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Citations
19 Claims
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1. A method, comprises:
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storing data representing a pattern for programming an array of individually controllable elements that modulate a beam;
dividing the pattern into a plurality of regions;
assigning an identifier corresponding to a portion of the pattern to each of the plurality of regions; and
storing the portion of the pattern corresponding to each unique identifier. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. An apparatus, comprising:
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a divider that divides a pattern used to adjust a patterning device into a plurality of regions;
an assigning device that assigns an identifier corresponding to a portion of the pattern to each of the plurality of regions; and
a storage device that stores the portion of the pattern corresponding to each unique identifier. - View Dependent Claims (16)
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17. A lithographic apparatus, comprising:
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an illumination system that supplies a beam of radiation;
an array of individually controllable elements that modulate the beam in accordance with at least one received pattern;
a projection system that projects the modulated beam onto a target portion of a substrate; and
a storage device that stores the pattern based on corresponding identifiers after the pattern has been divided into a plurality of regions each having a corresponding one of the identifiers. - View Dependent Claims (18, 19)
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Specification