Method for accurate high-resolution measurements of aspheric surfaces

• US 20060221350A1
• Filed: 04/05/2006
• Published: 10/05/2006
• Est. Priority Date: 04/05/2005
• Status: Active Grant

• Current Assignee: QED Technologies International, Inc. (Entegris Incorporated)
• Original Assignee: QED Technologies, Inc.
• Inventors: Miladinovic, Dragisha, Murphy, Paul E., DeVries, Gary M., Forbes, Greg W., Fleig, Jon F.
• Granted Patent: US 7,433,057 B2
• Time in Patent Office: Days
• US Class Current: 356/614
• CPC Class Codes: G01B 9/02039 by matching the wavefront with a particular object surface shape
• CPC Class Codes: G01B 9/02057 by using common path configuration, i.e. reference and object path almost entirely overlapping
• CPC Class Codes: G01B 9/02063 by particular alignment of focus position, e.g. dynamic focussing in optical coherence tomography
• CPC Class Codes: G01B 9/02072 by calibration or testing of interferometer
• CPC Class Codes: G01B 9/02085 Combining two or more images of different regions
• CPC Class Codes: G01J 9/02 by interferometric methods using interferometers for measuring optically the linear dimensions of objects G01B9/02
• CPC Class Codes: G01M 11/025 by determining the shape of the object to be tested measuring contours or curvatures by optical means G01B11/24
• CPC Class Codes: G01M 11/0257 by analyzing the image formed by the object to be tested
• CPC Class Codes: G01M 11/0271 by using interferometric methods
• CPC Class Codes: G01M 11/0278 Detecting defects of the object to be tested, e.g. scratches or dust investigating the presence of flaws or contamination on materials by optical means G01N21/88

Abstract

A system comprising a plurality of methods for measuring surfaces or wavefronts from a test part with greatly improved accuracy, particularly the higher spatial frequencies on aspheres. These methods involve multiple measurements of a test part. One of the methods involves calibration and control of the focusing components of a metrology gauge in order to avoid loss of resolution and accuracy when the test part is repositioned with respect to the gauge. Other methods extend conventional averaging methods for suppressing the higher spatial-frequency structure in the gauge'"'"'s inherent slope-dependent inhomogeneous bias. One of these methods involve averages that suppress the part'"'"'s higher spatial-frequency structure so that the gauge'"'"'s bias can be disambiguated; another method directly suppresses the gauge'"'"'s bias within the measurements. All of the methods can be used in conjunction in a variety of configurations that are tailored to specific geometries and tasks.

Claims

1. In a metrology system including a part-positioning means and a wavefront-measuring gauge, a method for obtaining high-accuracy measurements of surfaces or wavefronts with underlying symmetry in a design prescription, the method comprising the steps of:

a) acquiring a plurality of measurements at different relative positions of said part and gauge, and

b) performing at least one of the following steps;

i) determining said gauge'"'"'s optimal focus position for each of said measurements using knowledge of the local curvature of each test wavefront in said design prescription and gauge calibration constants;

ii) calibrating systematic gauge wavefront error in said measurements, by averaging said measurements having the same test conditions of said gauge and the positions of said measurements to average follow said symmetry, such that said gauge measurements at all of said positions would be identical if said part were perfectly matched to said design prescription;

iii) reducing uncalibrated error by averaging said measurements obtained at the same nominal location of the test part, but where two or more of said measurements have different orientations relative to said gauge; and

iv) reducing uncalibrated error by stitching said measurements together, where low spatial frequency information in said measurements is explicitly filtered out or compensated implicitly with free compensators.

2. In a metrology system including a part-positioning means and a wavefront-measuring gauge having a focusing stage and a plurality of constant first-order properties, a method for determining the first-order optical properties of the wavefront-measuring gauge and imaging conjugates as described by the

$\begin{array}{c}\text{equation}\end{array}$

⁢

1 ob + ob_ref + 1 im + im_ref = 1 f ,  

the method comprising the steps of;

a) determining “

ob_ref”

, the offset from an object reference point to a first principal plane within said gauge;

b) determining “

ob”

, the displacement from a test surface to said object reference point;

c) determining “

im_ref”

, the displacement from an F-axis mechanical origin Fo to a second principal plane within said gauge;

d) determining “

im”

, the position of the F-axis within the gauge; and

e) determining “

f”

, the focal length of the gauge'"'"'s optical system.

3. A method in accordance with claim 2 comprising the steps of:

a) setting up said wavefront-measuring gauge in the desired optical configuration;

b) setting up a sample part with a surface of known radius and known displacement from its confocal position in said metrology system;

c) adjusting the position of said focusing stage until said surface is observed to be in sharp focus;

d) recording the resulting pair of conjugate locations comprising the position of said focusing stage and the position of said part with respect to said known object reference point;

e) repeating steps b) through d) to obtain a plurality of different pairs of said conjugate locations; and

f) performing a fitting calculation on said pairs of conjugate locations by solving for said plurality of constant first-order properties of the gauge optical system, including at least the focal length, displacement from the object reference point to the first principal plane, and displacement from the focusing stage origin to the second principal plane.

4. A method in accordance with claim 2 for determining the position of the focusing stage such that the gauge is focused on a particular location, comprising the steps of:

a) calculating the object conjugate position of said particular location, based on knowledge of the local radius of curvature of the test wavefront and the position of the wavefront with respect to an object reference point and the first principal plane of said gauge'"'"'s optical system;

b) calculating the image conjugate position, based on said object conjugate position and the known focal length of said gauge'"'"'s optical system; and

c) calculating a focusing stage position wherein said gauge is focused onto said particular location, based on said image conjugate location and the known displacement from the origin of said focusing stage to the second principal plane of said gauge'"'"'s optical system.

5. In a metrology system including a part-positioning means and a wavefront-measuring gauge, a method for estimating and calibrating the systematic gauge wavefront error when testing a specific surface or wavefront of a part having underlying symmetry in a design prescription, the method comprising the steps of:

a) identifying said symmetry of said surface or wavefront;

b) selecting the gauge and test part measurement conditions under which to calibrate, including gauge configuration and position of said part;

c) acquiring a plurality of measurements at different relative positions of said part and gauge wherein said measurements meet said test conditions and said positions follow said symmetry, such that said gauge measurements at all of said positions would be identical if said part were perfectly matched to said design prescription; and

d) calculating a calibration of the systematic gauge wavefront error from said measurements.

6. A method in accordance with claim 5 wherein said test part is rotationally symmetric about an axis, said plurality of measurement positions are on a ring about said axis, and said calibration calculation is an average of said measurements.

7. A method in accordance with claim 6 wherein said average is selected from the group consisting of simple and weighted.

8. A method in accordance with claim 5 wherein said calibration calculation employs knowledge about said measurements, and wherein said method comprises the further steps of:

a) computing a weighted average of said measurements, said weights being determined by an estimate of measurement data quality; and

b) removing features that possess symmetry identical to that of said test part over a desired spatial band from said average.

9. A method in accordance with claim 5, wherein said gauge has underlying symmetry, comprising the additional steps of:

a) identifying said symmetry of said gauge;

b) acquiring a plurality of measurements at different relative orientations of the gauge with respect to the part wherein said positions follow said symmetry, such that said gauge measurements at all of said orientations would be identical if said part were perfectly matched to said design prescription;

c) calculating the gauge-symmetric contribution to the systematic gauge wavefront error from said measurements; and

d) separating the part'"'"'s contribution from the confounded symmetric error in said calibration of the systematic wavefront error.

10. In a metrology system including a part-positioning means and a wavefront-measuring gauge, a method for reducing the effects of systematic gauge wavefront error when testing a specific surface or wavefront from a part, the method comprising the steps of:

a) selecting a nominal position on said part to measure;

b) acquiring a plurality of measurements at said nominal position, said measurements having data points in common, wherein each of said measurements differs from said other measurements in at least one of position and orientation; and

c) averaging said measurements to form a common coordinate system, whilst accounting for any relative translations in said different measurements.

11. A method for synthesizing a full-aperture numerical data map of a test surface of an object from a plurality of overlapping subaperture data maps of said surface, comprising the steps of:

a) selecting at least one method for reduction of measurement error in said subaperture data maps;

b) collecting said plurality of subaperture numerical data maps of said surface from a plurality of regions of said surface, at least a portion of each such map overlapping a portion of at least one adjacent map to create a region of overlapping data;

c) projecting said plurality of overlapping data maps onto a global coordinate system with a nominal distortion map;

d) selecting a plurality of error compensators from at least one of two groups consisting of free compensators having free amplitude range and interlocked compensators having identical constrained amplitudes to compensate for stitching errors in said overlapping data regions; and

e) simultaneously minimizing mismatch of data from each of said data maps in said overlapping regions through linear combinations of said compensators.

12. A method in accordance with claim 11, wherein said systematic gauge error reduction method includes prefiltering said subaperture data, said filtering occurring after said subaperture data collection step but prior to said mismatch minimizing step, wherein said prefiltering removes low spatial frequency form from said subaperture data.

13. A method in accordance with claim 11, wherein said measurement error reduction method includes optimization of low spatial frequency deviations in said overlapping measurement regions wherein said low spatial frequency deviations are represented by mathematical basis functions, each such basis function being represented by a free compensator.

14. A method in accordance with claim 11 wherein said measurement error reduction method includes averaging of slope-dependent errors wherein said subaperture data maps include overlapping data of different local slopes at the same point in the overlapping map to average slope-dependent systematic errors of said gauge.