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Gate valve for plus-atmospheric pressure semiconductor process vessels

  • US 20060225811A1
  • Filed: 03/30/2005
  • Published: 10/12/2006
  • Est. Priority Date: 03/30/2005
  • Status: Active Grant
First Claim
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1. A load and containment apparatus, the apparatus comprising:

  • a process chamber including a first access opening; and

    a gate valve assembly coupled to the process chamber, the gate valve assembly including a second access opening, a third access opening, and a movable head assembly configurable into a first position where an access path through the first, second, and third access openings is clear, and a second position where the access path is blocked.

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