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Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method

  • US 20060232757A1
  • Filed: 03/23/2006
  • Published: 10/19/2006
  • Est. Priority Date: 09/26/2003
  • Status: Active Grant
First Claim
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1. A projection exposure apparatus in which a mask is illuminated with an exposure beam and transfers a pattern of the mask onto a substrate via a projection optical system and a liquid is filled in a space between a surface of the substrate and an optical element of the projection optical system on the substrate side, comprising:

  • a liquid supply and discharge mechanism, which supplies the liquid via a liquid supply tube, and recovers the liquid via a liquid recovery tube; and

    a scale adhesion prevention mechanism provided on the liquid supply tube.

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