×

Liquid processing method and liquid processing apparatus

  • US 20060233952A1
  • Filed: 07/07/2005
  • Published: 10/19/2006
  • Est. Priority Date: 04/15/2005
  • Status: Abandoned Application
First Claim
Patent Images

1. A liquid processing method with use of a nozzle unit having a plurality of processing-liquid nozzles arranged integrally and also connected to respective processing-liquid supply passages, for supplying a surface of a substrate with a processing liquid via one of the processing-liquid nozzles, the method comprising the steps of:

  • forming a processing-liquid layer, an air layer and a solvent layer in each tip of the processing-liquid nozzles of the nozzle unit, in order from the side of the processing-liquid supply passages;

    subsequently discharging the solvent layer from one of the processing-liquid nozzles of the nozzle unit to a drain part;

    supplying the surface of the substrate with a processing liquid through the one processing-liquid nozzle;

    sucking the processing liquid remaining in the one processing-liquid nozzle so as to cause a liquid level of the processing liquid in the one processing-liquid nozzle to retreat toward the processing-liquid supply passages;

    dipping the tip of at least the one processing-liquid nozzle of the nozzle unit into a solvent in a solvent reservoir for storing the solvent of the processing liquid; and

    sucking the one processing-liquid nozzle so as to cause the liquid level of the processing liquid in the one processing-liquid nozzle to further retreat toward the processing-liquid supply passages and also cause the solvent in the solvent reservoir to be sucked into the tip of the one processing-liquid nozzle, thereby forming a processing-liquid layer, an air layer and a solvent layer in the tip of the one processing-liquid nozzle, in order from the side of the processing-liquid supply passages.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×