SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
First Claim
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1. A method for manufacturing a semiconductor device in which a plurality of wiring layers are formed, comprising the steps of:
- preparing a semiconductor device on which a plurality of semiconductor elements are formed on one surface thereof;
forming a spiral inductor on the semiconductor substrate astride three or more wiring layers; and
forming a circuit wiring other than the spiral inductor in the plurality of wiring layers;
wherein the step of forming the spiral inductor and the step of forming the circuit wiring are performed simultaneously.
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Abstract
A method for manufacturing a semiconductor device in which a plurality of wiring layers are formed includes the steps of (a) preparing a semiconductor device on which a plurality of semiconductor elements are formed on one surface thereof, (b) forming a spiral inductor on the semiconductor substrate astride three or more wiring layers, and (c) forming a circuit wiring other than the spiral inductor in the wiring layer. The step of forming the spiral inductor and the step of forming the circuit wiring are performed simultaneously.
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20 Claims
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1. A method for manufacturing a semiconductor device in which a plurality of wiring layers are formed, comprising the steps of:
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preparing a semiconductor device on which a plurality of semiconductor elements are formed on one surface thereof;
forming a spiral inductor on the semiconductor substrate astride three or more wiring layers; and
forming a circuit wiring other than the spiral inductor in the plurality of wiring layers;
wherein the step of forming the spiral inductor and the step of forming the circuit wiring are performed simultaneously. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification