METHOD AND STRUCTURE FOR ION IMPLANTATION BY ION SCATTERING
First Claim
1. A method of adjusting a breakdown voltage of a semiconductor device, comprising the steps of:
- providing a scattering edge proximate to a region to be scatter-implanted; and
passing a dose of ions through the scattering edge to scatter a predetermined portion of the dose of ions from the scattering edge into the region to be scatter-implanted to form a semiconductor device having an adjusted breakdown voltage.
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Accused Products
Abstract
A scatter-implant process and device is provided where a bi-level doping pattern is achieved in a single doping step. Additionally, devices having different breakdown voltages can be produced in a single implant process. The scatter-implant is fabricated by scattering implant ions off the edge of a mask, thereby reducing the ion energy causing the ions to doping shallower regions than the non-scattered ions which dope a lower region. By adjusting various parameters of the doping process such as, for example, ion type, ion energy, mask type and geometry, in a position of scattering edge relative to other structure of the device, the scatter-implant can be tuned to achieve certain properties of the semiconductor device. Additionally, circuits can be made using the scatter-implant process where pre-selected portion of the circuit incorporate the scatter-implant region and other portions of the circuit do not rely on the scatter region.
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Citations
20 Claims
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1. A method of adjusting a breakdown voltage of a semiconductor device, comprising the steps of:
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providing a scattering edge proximate to a region to be scatter-implanted; and
passing a dose of ions through the scattering edge to scatter a predetermined portion of the dose of ions from the scattering edge into the region to be scatter-implanted to form a semiconductor device having an adjusted breakdown voltage. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of forming a bi-level implanted semiconductor device, comprising the steps of:
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arranging a scattering edge on a substrate;
forming a lower region of a bi-level implant by directing a first portion of a single dose of ions into a lower layer of the substrate; and
forming an upper region of the bi-level implant by directing a second portion of the single dose of ions into the scattering edge to scatter some ions of the second portion into an upper layer of the substrate. - View Dependent Claims (11, 12, 13, 14, 15)
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16. A semiconductor device, comprising:
a substrate having ions of a single dose direct-implanted in the substrate at a lower level and ions of the single dose scatter-implanted in the substrate above the direct-implanted ions to form a scatter-implanted region in the substrate. - View Dependent Claims (17, 18, 19, 20)
Specification