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Gas distribution showerhead featuring exhaust apertures

  • US 20060234514A1
  • Filed: 06/13/2006
  • Published: 10/19/2006
  • Est. Priority Date: 11/19/2003
  • Status: Active Grant
First Claim
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1. A method of processing a semiconductor workpiece, the method comprising:

  • flowing a process gas to a semiconductor workpiece through a first plurality of orifices positioned in a gas distribution faceplate; and

    removing gas from over the semiconductor workpiece through a chamber exhaust port and a second plurality of orifices positioned in the gas distribution faceplate.

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