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Optical lithography correction process

  • US 20060236271A1
  • Filed: 04/09/2005
  • Published: 10/19/2006
  • Est. Priority Date: 04/09/2005
  • Status: Active Grant
First Claim
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1. A pattern enhancement process, comprising the steps of:

  • characterizing the influence of individual ones of a plurality of worst-case process variations on a simulated nano-circuit layout design; and

    correcting said simulated nano-circuit layout design in response to said step of characterizing.

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