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Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

  • US 20060245057A1
  • Filed: 04/27/2005
  • Published: 11/02/2006
  • Est. Priority Date: 04/27/2005
  • Status: Active Grant
First Claim
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1. A multi-layer mirror, comprising:

  • a multi-layer stack, the multi-layer stack comprising a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack, the spectral filter top layer comprising a first spectral purity enhancement layer comprising a first material and having a first layer thickness d1;

    an intermediate layer comprising a second material and having a second layer thickness d2; and

    a second spectral purity enhancement layer comprising a third material and having a third layer thickness d3, the second spectral purity enhancement layer being arranged on the multi-layer stack top layer, wherein the first material is selected from Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF, the third material is selected from Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF, the second material comprises a material different from the first and third materials, and d1+d2+d3 has a thickness between 2.5 and 40 nm.

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