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Plasma processing apparatus and plasma processing method

  • US 20060249254A1
  • Filed: 07/03/2006
  • Published: 11/09/2006
  • Est. Priority Date: 03/16/1995
  • Status: Abandoned Application
First Claim
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1. A plasma processing apparatus including a vacuum processing chamber, a plasma generating unit, a process gas supply unit for supplying gas to the vacuum process chamber, a specimen table having a specimen holding surface for holding a specimen, and a vacuum pumping unit for evacuating the vacuum processing chamber;

  • wherein the specimen table comprises;

    electrostatic means for holding the specimen on a holding surface of the specimen table by electrostatic force;

    a specimen table cover arranged around the specimen table;

    a first heat transfer gas supply unit having a main path for supplying a heat transfer gas to the specimen holding surface for cooling the specimen; and

    a second heat transfer gas supply unit having a branch path branched from the main path of the first heat transfer gas supply unit for supplying a part of the heat transfer gas to a gap between an outer portion of the specimen holding surface and the specimen table cover.

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