Plasma processing apparatus and plasma processing method

• US 20060249254A1
• Filed: 07/03/2006
• Published: 11/09/2006
• Est. Priority Date: 03/16/1995
• Status: Abandoned Application

• Current Assignee: Kazue Takahashi, Kouichi Okamura, Ryoji Hamasaki, Saburo Kanai, Satoshi Ito
• Original Assignee: Kazue Takahashi, Kouichi Okamura, Ryoji Hamasaki, Saburo Kanai, Satoshi Ito
• Inventors: Ito, Satoshi, Takahashi, Kazue, Hamasaki, Ryoji, Okamura, Kouichi, Kanai, Saburo
• Application Number:
  US11/478,629
• Publication Number:
  US 20060249254A1
• Time in Patent Office: Days
• US Class Current: 156/345.370
• CPC Class Codes: H01J 2237/022 Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
• CPC Class Codes: H01J 37/32504 Means for preventing sputtering of the vessel
• CPC Class Codes: H01J 37/32522 Temperature
• CPC Class Codes: H01L 21/3065 Plasma etching; Reactive-ion etching
• CPC Class Codes: H01L 21/67069 for drying etching
• CPC Class Codes: H01L 21/67109 mainly by convection
• CPC Class Codes: H01L 21/6831 using electrostatic chucks

Abstract

A plasma processing apparatus and method which includes a vacuum processing chamber, a plasma generating unit, a process gas supply unit, a specimen table, and a vacuum pumping unit. The specimen table includes an electrostatic arrangement for holding a specimen on a holding surface of the specimen table by electrostatic force, a specimen table cover arranged around the specimen table, and first and second heat transfer gas supply units. The first heat transfer gas supply unit has a main path for supplying a heat transfer gas to the specimen holding surface for cooling the specimen, and the second heat transfer gas supply unit has a branch path branched from the main path of the first heat transfer gas supply unit for supplying a part of the heat transfer gas to a gap between an outer portion of the specimen holding surface and the specimen table cover.

Claims

1. A plasma processing apparatus including a vacuum processing chamber, a plasma generating unit, a process gas supply unit for supplying gas to the vacuum process chamber, a specimen table having a specimen holding surface for holding a specimen, and a vacuum pumping unit for evacuating the vacuum processing chamber;

wherein the specimen table comprises;

electrostatic means for holding the specimen on a holding surface of the specimen table by electrostatic force;

a specimen table cover arranged around the specimen table;

a first heat transfer gas supply unit having a main path for supplying a heat transfer gas to the specimen holding surface for cooling the specimen; and

a second heat transfer gas supply unit having a branch path branched from the main path of the first heat transfer gas supply unit for supplying a part of the heat transfer gas to a gap between an outer portion of the specimen holding surface and the specimen table cover.

2. The plasma processing apparatus according to claim 1, comprising a gas sealing unit arranged between the outer portion of the specimen holding surface and the specimen table cover so as to form the gap.

3. A plasma processing method for processing a specimen by a plasma processing apparatus including a vacuum process chamber, a plasma generating unit, a process gas supply unit for supplying gas to the vacuum process chamber, a specimen table including a specimen holding surface for holding a specimen, an electrostatic means for holding the specimen on the holding surface, and a specimen table cover arranged at an outer peripheral portion of the specimen holding surface for covering the specimen table;

wherein the processing method comprises the steps of;

holding the specimen on the holding surface of the specimen table by an electrostatic force generated by the electrostatic means;

supplying a heat transfer gas to the specimen holding surface for cooling the specimen through a main path of a first heat transfer gas supply unit; and

supplying a part of the heat transfer gas to a gap between the outer portion of the specimen holding surface and the specimen table cover through a branch path of a second heat transfer gas supply unit branched from the main path of the first heat transfer gas supply unit;

whereby temperature fluctuation of the specimen table cover during processing of the specimen is restrained.