Utilities transfer system in a lithography system

• US 20060250595A1
• Filed: 06/23/2006
• Published: 11/09/2006
• Est. Priority Date: 12/12/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Phillips, Alton Hugh
• Granted Patent: US 8,619,234 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70808 Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation
• CPC Class Codes: G03F 7/70991 Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Abstract

Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques involve transferring utilities to and from the stage without making physical contact with the stage. Alternatively, utilities are transferred by making physical contact with the stage while the stage is in a stationary position. In addition to transferring utilities to and from the stage, devices such as processing devices, buffers (storage mediums), electrical components, and mechanical components can be placed within the stage to use and/or control the transferred utilities.

Claims

1. A stage system comprising:

a transformer that includes an inductive core, an inductive primary coil, and an inductive secondary coil; and

a stage device that supports the secondary coil;

said primary coil and said secondary coil configured to surround at least a portion of the inductive core, and the inductive core and the secondary coil substantially maintain a separation distance from each other during relative movement between the stage and the inductive core;

wherein an electrical current of the primary coil creates an electromagnetic field that causes an electrical current, via the inductive core, to flow within the secondary coil.

2. A stage system as recited in claim 1, wherein

the relative movement between the stage device and the inductive core is along an axis of the inductive core that the secondary coil surrounds.

3. A stage system as recited in claim 2, wherein

the stage device moves relative to the inductive core substantially along a plane.

4. A stage system as recited in claim 1, wherein

the stage device is supported through at least one of air levitation and electromagnetic levitation.

5. A stage system as recited in claim 1, wherein

said stage device includes one of a wafer substrate and a reticle substrate that supports said secondary coil.

6. A stage system as recited in claim 2, wherein

the stage device moves relative to the inductive core along a scanning axis that is substantially parallel to at least a portion of the inductive core.

7. A stage system as recited in claim 1, wherein

the stage device houses two or more secondary coils, each of the secondary coils surrounds at least portion of the inductive core.

8. A stage system as recited in claim 1 further comprising:

at least one of a stage radio frequency transmitter, a receiver, a transceiver and a battery that is supported by the stage device and provided with electrical current from the secondary coil.

9. A lithography apparatus comprising:

a lens assembly that projects and/or focuses the light or beam from an illumination system;

a transformer that includes an inductive core, an inductive primary coil, and an inductive secondary coil; and

a stage device that supports the secondary coil;

said primary coil and said secondary coil configured to surround at least a portion of the inductive core, and the inductive core and the secondary coil substantially maintain a separation distance from each other during relative movement between the stage and the inductive core;

wherein an electrical current of the primary coil creates an electromagnetic field that causes an electrical current, via the inductive core, to flow within the secondary coil.

10. A lithography apparatus as recited in claim 9, wherein

the relative movement between the stage device and the inductive core is along an axis of the inductive core that the secondary coil surrounds.

11. A lithography apparatus as recited in claim 10, wherein

the stage device moves relative to the inductive core substantially along a plane.

12. A lithography apparatus as recited in claim 9, wherein

the stage device is supported through at least one of air levitation and electromagnetic levitation.

13. A lithography apparatus as recited in claim 9, wherein

said stage device includes one of a wafer substrate and a reticle substrate that supports said secondary coil.

14. A lithography apparatus as recited in claim 10, wherein

the stage device moves relative to the inductive core along a scanning axis that is substantially parallel to at least a portion of the inductive core.

15. A lithography apparatus as recited in claim 9, wherein

the stage device houses two or more secondary coils, each of the secondary coils surrounds at least portion of the inductive core.

16. A lithography apparatus as recited in claim 9 further comprising:

at least one of a stage radio frequency transmitter, a receiver, a transceiver and a battery that is positioned within the stage device and provided with electrical current from the secondary coil.