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Exposure apparatus and method for producing device

  • US 20060250596A1
  • Filed: 07/07/2006
  • Published: 11/09/2006
  • Est. Priority Date: 12/10/2002
  • Status: Active Grant
First Claim
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1. An exposure apparatus comprising:

  • a projection optical system for projecting a pattern on a reticle onto an object to be exposed;

    a reference mark that serves as a reference for an alignment between the reticle and the object;

    a first fluid that has a refractive index of 1 or greater, and fills a space between at least part of said projection optical system and the object and a space between at least part of said projection optical system and the reference mark; and

    an alignment mechanism for aligning the object by using said projection optical system and the first fluid.

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