Etching high-kappa dielectric materials with good high-kappa foot control and silicon recess control

• US 20060252265A1
• Filed: 05/11/2005
• Published: 11/09/2006
• Est. Priority Date: 03/06/2002
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Shen, Meihua, Jin, Guangxiang
• Application Number:
  US11/126,472
• Publication Number:
  US 20060252265A1
• Time in Patent Office: Days
• US Class Current: 438/689
• CPC Class Codes: H01L 21/02181 the material containing hafnium, e.g. HfO2
• CPC Class Codes: H01L 21/02183 the material containing tantalum, e.g. Ta2O5
• CPC Class Codes: H01L 21/02189 the material containing zirconium, e.g. ZrO2
• CPC Class Codes: H01L 21/31116 by dry-etching
• CPC Class Codes: H01L 21/31122 of layers not containing Si, e.g. PZT, Al2O3
• CPC Class Codes: H01L 21/31637 Deposition of Tantalum oxides, e.g. Ta2O5
• CPC Class Codes: H01L 21/31641 Deposition of Zirconium oxides, e.g. ZrO2
• CPC Class Codes: H01L 21/31645 Deposition of Hafnium oxides, e.g. HfO2

Abstract

An apparatus and a method for etching high dielectric constant (high-κ) materials using halogen containing gas and reducing gas chemistries are provided. One embodiment of the method is accomplished by etching a layer using two etch gas chemistries in separate steps. The first etch gas chemistry contain no oxygen containing gas in order to break through etching of the high dielectric constant materials, to dean any residues left from previous polysilicon etch process resulting in less high-κ foot, and also to control silicon recess problem associated with an underlying silicon oxide layer. The second over-etch gas chemistry provides a high etch selectivity for high dielectric constant materials over silicon oxide materials to be combined with low source power to further reduce silicon substrate oxidation problem.

Claims

1. A method of plasma etching a substrate having a layer containing a high-κ

material, comprising;

exposing the layer to a plasma formed from a first process gas mixture comprising a first halogen containing gas without introducing an oxygen containing gas inside an etch chamber;

etching at least a portion of the layer in a first etch step; and

etching the layer in a second etch step using a plasma formed from a second process gas mixture comprising a second halogen containing gas and carbon monoxide.

2. The method of claim 1, wherein the high-κ

material comprises a material selected from the group consisting of hafnium dioxide, zirconium dioxide, hafnium silicon oxide, zirconium silicon oxide, tantalum dioxide, aluminum oxide, aluminum doped hafnium dioxide, and combinations thereof.

3. The method of claim 2, wherein the layer further comprises a material for gate electrode selected from the group consisting of tantalum, tantalum nitride, tantalum silicon nitride, titanium nitride, and combinations thereof.

4. The method of claim 1, wherein the first halogen containing gas comprises a chlorine containing gas.

5. The method of claim 4, wherein the chlorine containing gas is selected from the group consisting of chlorine gas (Cl₂), boron chloride (BCl₃), hydrogen chloride (HCl), and combinations thereof.

6. The method of claim 1, wherein the first process gas mixture further comprises a reducing agent.

7. The method of claim 6, wherein the reducing agent is a gas selected from the group consisting of methane(CH₄), ethane(C₂H₆), ethylene(C₂H₄), and combinations thereof.

8. The method of claim 1, wherein the first process gas mixture further comprises a gas selected from the group consisting of helium (He), argon (Ar), nitrogen gas (N₂), and combinations thereof.

9. The method of claim 1, wherein the second halogen containing gas comprises a chlorine containing gas.

10. The method of claim 9, wherein the chlorine containing gas is selected from the group consisting of chlorine gas (Cl₂), boron chloride (BCl₃), hydrogen chloride (HCl), and combinations thereof.

11. The method of claim 1, wherein the second process gas mixture further comprises a gas selected from the group consisting of helium (He), argon (Ar), nitrogen gas (N₂), and combinations thereof.

12. The method of claim 1, wherein etching at least a portion of the layer without oxidizing a portion of the substrate is performed at a low bias power of less than about 100 Watts.

13. The method of claim 12, wherein the bias power is set at zero.

14. The method of claim 1, wherein the first etch step is performed at a high substrate temperature of between about 150 degrees Celsius and about 350 degrees Celsius.

15. The method of claim 1, wherein the second etch step is performed at a source power of between about 200 W to about 800 W.

16. A method of plasma etching a substrate having a layer containing a high-κ

material, comprising;

etching at least a portion of the layer with a plasma formed from a first process gas mixture comprising a first halogen containing gas at a substrate bias power of 100 W or less inside an etch chamber; and

etching the layer with a plasma formed from a second process gas mixture comprising a second halogen containing gas and carbon monoxide with a selectivity for the layer and at a source power of between about 200 W to about 800 W.

17. The method of claim 16, wherein the layer comprises a high-κ

dielectric material selected from the group consisting of hafnium dioxide, zirconium dioxide, hafnium silicon oxide, zirconium silicon oxide, tantalum dioxide, aluminum oxide, aluminum doped hafnium dioxide, and combinations thereof.

18. The method of claim 17, wherein the layer further comprises a material for gate electrode selected from the group consisting of tantalum, tantalum nitride, tantalum silicon nitride, titanium nitride, and combinations thereof.

19. The method of claim 16, wherein the first halogen containing gas comprises a chlorine containing gas selected from the group consisting of chlorine gas (Cl₂), boron chloride (BCl₃), hydrogen chloride (HCl), and combinations thereof.

20. The method of claim 16, wherein the first process gas mixture further comprises a reducing agent selected from the group consisting of methane(CH₄), ethane(C₂H₆), ethylene(C₂H₄), and combinations thereof.

21. The method of claim 16, wherein the second halogen containing gas comprises a chlorine containing gas selected from the group consisting of chlorine gas (Cl₂), boron chloride (BCl₃), hydrogen chloride (HCl), and combinations thereof.

22. The method of claim 16, wherein etching at least a portion of the layer with the plasma formed from the first process gas mixture is performed at zero substrate bias power.

23. The method of claim 16, wherein etching at least a portion of the layer with the plasma formed from the first process gas mixture is performed at a high substrate temperature of between about 150°

C. and about 350°

C.

24. The method of claim 16, wherein the selectivity of the second process gas mixture for the layer to silicon oxide is greater than about 30:

1.