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Lithographic apparatus and device manufacturing method

  • US 20060256309A1
  • Filed: 07/14/2006
  • Published: 11/16/2006
  • Est. Priority Date: 02/27/2004
  • Status: Active Grant
First Claim
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1. A system, comprising:

  • an illumination system configured to generate a beam of radiation;

    a patterning device configured to pattern the beam of radiation;

    a projection system configured to project the patterned beam onto a target portion of a substrate, the substrate located within a first plane, the projection system including an array of focusing elements located within a second plane; and

    an actuator system configured to move the array of focusing elements along an axis that is perpendicular to the first and second planes.

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