Lithographic apparatus and device manufacturing method

• US 20060256309A1
• Filed: 07/14/2006
• Published: 11/16/2006
• Est. Priority Date: 02/27/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: de Jager, Pieter Willem Herman, Gui, Cheng-Qun
• Granted Patent: US 7,324,186 B2
• Time in Patent Office: Days
• US Class Current: 355/55
• CPC Class Codes: G03F 7/7025 Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels
• CPC Class Codes: G03F 7/70816 Bearings
• CPC Class Codes: G03F 7/70825 Mounting of individual elements, e.g. mounts, holders or supports workpiece or mask holders G03F7/707
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of individually controllable elements to impart the pattern to the patterned beam.

Claims

1. A system, comprising:

an illumination system configured to generate a beam of radiation;

a patterning device configured to pattern the beam of radiation;

a projection system configured to project the patterned beam onto a target portion of a substrate, the substrate located within a first plane, the projection system including an array of focusing elements located within a second plane; and

an actuator system configured to move the array of focusing elements along an axis that is perpendicular to the first and second planes.

2. The system of claim 1, wherein the array of focusing elements comprises:

a radiation blocking portion located between each of the focusing elements, the radiation blocking portion preventing radiation within the patterned beam, which is not incident on the focusing elements, from reaching the substrate.

3. The system of claim 1, wherein the illumination system generates a second beam of radiation, and the system further comprises:

a second patterning device that patterns the second beam of radiation; and

a second projection system that projects the second patterned beam onto a second target portion of the substrate, the second projection system including a second array of focusing elements,

wherein each of the second array of focusing elements projects a respective portion of the second patterned beam onto a corresponding portion of the second target portion of the substrate, and

wherein the actuator system moves the first array of focusing elements relative to the second array of focusing elements.

4. The system of claim 3, further comprising:

a second actuator system configured to move the second array of focusing elements relative to the second patterning device.

5. The system of claim 4, wherein the second array of focusing elements move relative to the second patterning device in at least one of a first direction substantially parallel to the face of the substrate on which the second patterned beam is incident, a second direction perpendicular to the first direction and substantially parallel to the face of the substrate on which the second patterned beam is incident, a third direction substantially perpendicular to the face of the substrate on which the second patterned beam is incident, and rotationally about one or more axes substantially parallel to the first, second and third directions.

6. The system of claim 4, further comprising:

a reference frame, wherein the first and second actuator systems are mounted to the reference frame, such that the first and second actuator systems move the first and second arrays of focusing elements, respectively, relative to the reference frame.

7. The system of claim 6, wherein the first and second patterning devices are mounted to the reference frame.

8. The system of claim 6, wherein the elements of the first and second projection systems, other than the arrays of focusing elements, are mounted to the reference frame.

9. The system of claim 1, wherein the array of focusing elements further moves relative to the patterning device in at least one of:

(a) a first direction substantially parallel to the face of the substrate on which the patterned beam is incident, (b) a second direction perpendicular to the first direction and substantially parallel to the face of the substrate on which the patterned beam is incident, and (c) rotationally about one or more axes substantially parallel to the first, second and third directions.

10. A method, comprising:

patterning a beam of radiation using a patterning device;

projecting the patterned beam onto a target portion of a substrate lying within a first plane using an array of focusing elements lying within a second plane, such that each of the focusing elements projects a respective portion of the patterned beam onto a corresponding portion of the target portion of the substrate; and

moving the array of focusing elements along an axis that is perpendicular to the first and second planes.

11. The method of claim 10, further comprising:

adjusting the array of focusing elements relative to the patterning device in at least one of;

(a) a first direction substantially parallel to the face of the substrate on which the patterned beam is incident, (b) a second direction perpendicular to the first direction and substantially parallel to the face of the substrate on which the patterned beam is incident, and (c) rotationally about one or more axes substantially parallel to the first, second and third directions.