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Periodic patterns and technique to control misalignment between two layers

  • US 20060262326A1
  • Filed: 07/27/2006
  • Published: 11/23/2006
  • Est. Priority Date: 04/10/2001
  • Status: Abandoned Application
First Claim
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1. A method of measuring line profile asymmetries in microelectronic devices, the method comprising the steps of:

  • directing light at an array of microelectronic features of a microelectronic device;

    detecting light scattered back from the array comprising one or more features selected from the group consisting of one or more angles of reflection and one or more wavelengths; and

    comparing one or more characteristics of the back-scattered light by performing an operation comprising examining data from complementary angles of reflection.

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