Interspinous process implant with slide-in distraction piece and method of implantation
First Claim
1. An interspinous implant adapted to be arranged between spinous processes, the implant comprising:
- an initiating piece; and
a distraction piece that can be slidably associated with the initiating piece so that the distraction piece is disposed adjacent the initiating piece;
wherein the initiating piece is adapted to be arranged between the spinous processes before the distraction piece is disposed over the initiating piece.
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Accused Products
Abstract
Systems and method in accordance with embodiments of the present invention can includes an implant having an initiating piece and a distraction piece. The initiating piece can include a lower distraction element, a lower portion of a second wing, a lower portion of a spacer, and a lower portion of a first wing. The initiating piece can be positioned such that an interspinous ligament of the targeted motion segment is disposed between the first and second wing. The distraction piece can include an upper distraction element, an upper portion of a second wing, an upper portion of the spacer, and an upper portion of the first wing, and can be mated with the initiating piece by mating a rail of the distraction piece with a slot of the initiating piece, or the implant is disposed between adjacent spinous processes.
295 Citations
20 Claims
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1. An interspinous implant adapted to be arranged between spinous processes, the implant comprising:
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an initiating piece; and
a distraction piece that can be slidably associated with the initiating piece so that the distraction piece is disposed adjacent the initiating piece;
wherein the initiating piece is adapted to be arranged between the spinous processes before the distraction piece is disposed over the initiating piece. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 15, 16, 17, 18)
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10. An interspinous implant adapted to be arranged between spinous processes, the interspinous implant having a first wing at a distal end of the interspinous implant, a second wing, a spacer disposed between the first wing and the second wing, and a distraction guide at the proximal end of the interspinous implant, wherein the improvement comprises:
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the implant includes an initiating piece and a distraction piece adapted to be slidably associated with one another;
wherein the initiating piece includes an initiating sliding surface and an initiating contact surface, the initiating contact surface having a first portion of the first wing, a first portion of the spacer, a first portion of the second wing and a first portion of the distraction guide; and
wherein the distraction piece includes a distraction sliding surface and a distraction contact surface, the distraction contact surface having a second portion of the first wing, a second portion of the spacer, a second portion of the second wing and a second portion of the distraction guide. - View Dependent Claims (11, 12, 13, 14)
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19. A method of arranging an interspinous implant between spinous processes, the implant having a first wing, a second wing, and a spacer disposed between the first wing and the second wing, the method comprising:
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using the implant, the implant including an initiating piece and a distraction piece adapted to be slidably associated with the initiating piece, the initiating piece and the distraction piece each having a portion of a first wing, a portion of a second wing, and a portion of a spacer disposed between the first wing and the second wing;
urging the initiating piece between the spinous processes so that the portion of the spacer is disposed between the spinous processes;
slidably associating the distraction piece with the initiating piece so that the distraction piece is disposed over the initiating piece such that the spacer is disposed between the spinous processes.
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20. The method of claim 20,
wherein: -
the initiating piece includes a cavity disposed therein; and
the distraction piece includes a protrusion extending therefrom; and
further comprising;
arranging the protrusion within the cavity.
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Specification