Lithographic device, device manufacturing method and device manufactured thereby
First Claim
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1. A lithographic apparatus configured to project a pattern from a patterning device onto a substrate, the apparatus comprising:
- a gas purged sealing aperture extending between at least two different zones of the apparatus; and
a gas supplier configured to supply the sealing aperture with one or more gases selected from a group comprising hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
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Abstract
A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
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Citations
25 Claims
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1. A lithographic apparatus configured to project a pattern from a patterning device onto a substrate, the apparatus comprising:
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a gas purged sealing aperture extending between at least two different zones of the apparatus; and
a gas supplier configured to supply the sealing aperture with one or more gases selected from a group comprising hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A seal for a lithographic apparatus comprising a gas purged sealing aperture extending between two zones of the apparatus, wherein the seal is provided with at least one gas supplier configured to supply the sealing aperture with at least one gas from a group comprising hydrogen, heavy hydrogen, deuterium, deuterated hydrogen, and a mixture of argon and hydrogen.
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21. A device manufacturing method comprising:
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projecting a patterned beam of radiation onto a substrate in a lithographic apparatus;
sealing at least two zones of the apparatus from each other with at least one sealing aperture; and
purging said sealing aperture with at least one gas selected from the group comprising hydrogen, helium, deuterated hydrogen, deuterium, heavy hydrogen, and a mixture of argon and hydrogen. - View Dependent Claims (22, 23, 24, 25)
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Specification