Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression

• US 20060269116A1
• Filed: 05/31/2005
• Published: 11/30/2006
• Est. Priority Date: 05/31/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Kessels, Lambertus Gerardus Maria, Venema, Willem Jurrianus, Makarovic, Andrej, Bontekoe, Marcel
• Granted Patent: US 7,477,772 B2
• Time in Patent Office: Days
• US Class Current: 382/141
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
• CPC Class Codes: G03F 7/70558 Dose control, i.e. achievement of a desired dose

Abstract

A lithographic apparatus comprises an array of individually controllable elements and a data processing pipeline. The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. The storage device stores the intermediate representation. The online rasterizer accesses the stored intermediate representation and produces therefrom a stream of bitmap data to be used to generate the sequence of control data substantially in real time.

Claims

1. A lithographic apparatus, comprising:

an array of individually controllable elements that modulate a beam of radiation;

a data processing pipeline that converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements to substantially form the requested dose pattern on a substrate, wherein the data processing pipeline comprises;

an offline pre-processing device that converts the first representation of the requested dose pattern to an intermediate representation that is rasterized in a fewer number of operations than the first representation;

a storage device that stores the intermediate representation; and

an online rasterizer that accesses the stored intermediate representation and produces therefrom a stream of bitmap data to be used to generate the sequence of control data substantially in real time.

2. The lithographic apparatus according to claim 1, wherein the intermediate representation is rasterized in a fewer number of memory access operations than the first representation.

3. The lithographic apparatus according to claim 1, wherein the intermediate representation is rasterized using less computational hardware than the first representation.

4. The lithographic apparatus according to claim 1, wherein the first representation represents repeating groups of elements in the requested dose pattern using a hierarchy.

5. The lithographic apparatus according to claim 4, wherein the intermediate representation contains at least one level of hierarchy less than the first representation from which it is derived.

6. The lithographic apparatus according to claim 5, wherein the intermediate representation has only a single level of hierarchy.

7. The lithographic apparatus according to claim 6, wherein the requested dose pattern corresponds to a device layer in the manufacture of Flat Panel Displays and the single level of hierarchy represents a plurality of identical Flat Panel Display pixels.

8. The lithographic apparatus according to claim 1, wherein the offline preprocessing device divides requested dose pattern data in the first representation into a plurality of portions, each corresponding to a particular region of the requested dose pattern, and wherein each portion is converted to an intermediate representation and rasterized separately.

9. The lithographic apparatus according to claim 1, wherein the first representation expresses the requested dose pattern in terms of overlapping geometric units and the preprocessing device produces an intermediate representation in which the overlap is at least partially removed.

10. The lithographic apparatus according to claim 1, wherein:

each portion of the requested pattern represented by a vector in the first representation is represented in the intermediate representation by the X and Y coordinates of a first point of the vector to be exposed, an angle of the vector relative to an axis lying in a plane of the substrate, and the Y-coordinate or X-coordinate of a last point of the vector to be exposed;

the X and Y axes are orthogonal axes lying in the plane of the substrate; and

the Y-axis is substantially parallel to a scanning direction of the substrate relative to the array of individually controllable elements.

11. The lithographic apparatus according to claim 1, wherein:

portions of the requested pattern represented by curves in the first representation are each represented in the intermediate representation by the X and Y coordinates of a first point of a curved portion to be exposed, a mathematical relation describing a shape of the curved portion, and the Y-coordinate or X-coordinate of a last point of the curved portion to be exposed; and

the X and Y axes are orthogonal axes lying in the plane of the substrate and the Y-axis is substantially parallel to a scanning direction of the substrate relative to the array of individually controllable elements.

12. The lithographic apparatus according to claim 1, wherein:

the bitmap data is composed of a sequence of lines of bitmap values, ordered substantially according to an exposure sequence of portions of the requested pattern defined by the lines;

a plurality of modification rules define how the bitmap values change from line to line in the sequence of lines;

each one of at least a subset of the modification rules is derivable from a corresponding portion of the requested dose pattern represented by a vector and is applicable for all lines affected by that vector; and

the offline pre-processing device produces an intermediate representation comprising a sequence of data packets, each describing how a group of modification rules relevant for a given line is different from a group of modification rules relevant for a preceding line.

13. The lithographic apparatus according to claim 12, wherein:

the

bitmap data uses a 1-dimensional run-length encoding to represent each line of bitmap values; and

the modification rules define how the 1-dimensional run-length encoding of each line of bitmap values changes from line to line in the sequence of lines.

14. The lithographic apparatus according to claim 1, wherein:

the bitmap data is composed of a sequence of lines of bitmap values, ordered substantially according to an exposure sequence of portions of the requested pattern defined by the lines;

a plurality of modification rules define how the bitmap values change from line to line in the sequence of lines;

each one of at least a subset of the modification rules is derivable from a corresponding portion of the requested dose pattern represented by a curved section with constant properties and is applicable for all lines affected by that curved section; and

the offline pre-processing device produces an intermediate representation comprising a sequence of data packets, each describing how a group of modification rules relevant for a given line is different from a group of modification rules relevant for a preceding line.

15. The lithographic apparatus according to claim 14, wherein:

the bitmap data uses a 1-dimensional run-length encoding to represent each the line of bitmap values; and

the modification rules define how the 1-dimensional run-length encoding of each line of bitmap values changes from line to line in the sequence of lines.

16. The lithographic apparatus according to claim 1, wherein portions of the requested pattern represented by vectors in the first representation are re-ordered by the offline pre-processing device and stored in the intermediate representation in such a way as to be accessible to the online rasterizer substantially in the order in which each vector contributes to the sequence of control data.

17. The lithographic apparatus according to claim 1, wherein portions of the requested pattern represented by curves in the first representation are re-ordered by the offline pre-processing device and stored in the intermediate representation in such a way as to be accessible to the online rasterizer substantially in the order in which each curved portion contributes to the sequence of control data.

18. The lithographic apparatus according to claim 1, wherein features of the first representation are described in the intermediate representation in terms of a plurality of non-overlapping polygons.

19. The lithographic apparatus according to claim 18, wherein the polygons are ordered by the offline pre-processing device and stored in the intermediate representation in such a way as to be accessible to the online rasterizer substantially in the order in which each polygon contributes to the sequence of control data.

20. The lithographic apparatus according to claim 18, wherein the non-overlapping polygons are trapezoids.

21. The lithographic apparatus according to claim 1, wherein the storage device is accessible by the online rasterizer and configured to store at least the portion of the intermediate representation of the requested dose pattern relevant to the portion of the pattern being rasterized at any given time.

22. The lithographic apparatus according to claim 5, further comprising:

an online pre-processing device configured to remove all remaining levels of hierarchy in the intermediate representation and pass the resulting flattened intermediate representation to the online rasterizer.

23. The lithographic apparatus according to claim 1, wherein the intermediate representation comprises a quadtree representation of the requested dose pattern.

24. The lithographic apparatus according to claim 23, further comprising a plurality of the arrays of individually controllable elements, wherein the intermediate representation comprises a multi-quadtree representation in which the root node for each tree substantially corresponds to a region of the substrate exposed by one of the plurality of arrays of individually controllable elements at a particular time.

25. A device manufacturing method, comprising:

modulating a beam of radiation using an array of individually controllable elements;

converting a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate;

converting the first representation of the requested dose pattern offline to an intermediate representation that is rasterized in a fewer number of operations than the first representation;

storing the intermediate representation in a storage device; and

accessing the stored intermediate representation and producing therefrom a stream of bitmap data to be used to generate the sequence of control data substantially in real time.

26. The device manufacturing method according to claim 25, wherein:

the bitmap data is composed of a sequence of lines of bitmap values, ordered substantially according to an exposure sequence of portions of the requested pattern defined by the lines; and

a plurality of modification rules define how the bitmap values change from line to line in the sequence of lines, the plurality of modification rules comprising,

deriving each one of at least a subset of the modification rules from a corresponding portion of the requested dose pattern represented by a vector and applying each such modification rule for all lines affected by the corresponding vector; and

producing an intermediate representation comprising a sequence of data packets, each describing how a group of modification rules relevant for a given line is different from a group of modification rules relevant for a preceding line.

27. The device manufacturing method according to claim 26, wherein the bitmap data uses a 1-dimensional run-length encoding to represent each the line of bitmap values and the modification rules define how the 1-dimensional run-length encoding of each line of bitmap values changes from line to line in the sequence of lines.

28. The device manufacturing method according to claim 25, wherein:

the bitmap data is composed of a sequence of lines of bitmap values, ordered substantially according to an exposure sequence of portions of the requested pattern defined by the lines; and

a plurality of modification rules define how the bitmap values change from line to line in the sequence of lines, the plurality of modification rules comprising,

deriving each one of at least a subset of the modification rules from a corresponding portion of the requested dose pattern represented by a curved section with constant properties and applying each such modification rule for all lines affected by that curved section; and

producing an intermediate representation comprising a sequence of data packets, each describing how a group of modification rules relevant for a given line is different from a group of modification rules relevant for a preceding line.

29. The device manufacturing method according to claim 28, wherein the bitmap data uses a 1-dimensional run-length encoding to represent each the line of bitmap values and the modification rules define how the 1-dimensional run-length encoding of each line of bitmap values changes from line to line in the sequence of lines.

30. A flat-panel display manufactured according to the method of claim 25.

31. An integrated circuit device manufactured according to the method of claim 25.

32. A computer program product for controlling a lithographic apparatus comprising a computer useable medium having a computer program logic recorded thereon for controlling at least one processor, the computer program logic comprising:

computer program code means for modulating a beam of radiation using an array of individually controllable elements;

computer program code means for converting a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate;

computer program code means for converting the first representation of the requested dose pattern offline to an intermediate representation that is rasterized in a fewer number of operations than the first representation;

computer program code means for storing the intermediate representation in a storage device; and

computer program code means for accessing the stored intermediate representation and producing therefrom a stream of bitmap data to be used to generate the sequence of control data substantially in real time.