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Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor

  • US 20060279719A1
  • Filed: 06/13/2005
  • Published: 12/14/2006
  • Est. Priority Date: 06/13/2005
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, comprising:

  • an illumination system that supplies a beam of radiation;

    an array of individually controllable elements that pattern the beam;

    a projection system that projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots;

    a substrate table for supporting a substrate, such that a target surface of the substrate is substantially coincident with the target plane; and

    a sensor system comprising an array of detector elements arranged to receive at least one of the spots, the sensor system measuring energy of the at least one spot and providing an output signal indicative of the energy of the or each received spot.

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