Lithographic apparatus and device manufacturing method for writing a digital image

• US 20060281032A1
• Filed: 06/08/2005
• Published: 12/14/2006
• Est. Priority Date: 06/08/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Groos, Pieter Johannes Marius
• Granted Patent: US 7,742,148 B2
• Time in Patent Office: Days
• US Class Current: 430/397
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/70475 Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Abstract

First pluralities of radiation spots generated by an array of individually controllable elements are exposed on a substrate. The radiation spots are equally spaced across an entire area of the substrate to be exposed. The substrate is then shifted relative to the array of individually controllable elements in a direction perpendicular to a scanning direction of the substrate. Second pluralities of radiation spots generated by the array of individually controllable elements are alternatingly formed on the substrate with respect to each of the first plurality of spots.

Claims

1. A device manufacturing method, comprising:

modulating a radiation beam using first and second patterning arrays of individually controllable elements;

projecting a first plurality of radiation spots onto a substrate, based on the beam being modulated by the first patterning array of individually controllable elements, to form a first plurality of spot exposures on the substrate;

scanning the substrate in a first direction while projecting the first plurality of radiation spots; and

projecting a second plurality of radiation spots onto the substrate, based on the beam being modulated by the second patterning array of individually controllable elements, to form a second plurality of spot exposures on the substrate,

wherein formation of each of the second plurality of spot exposures on the substrate alternates with formation of each of the first plurality of spot exposures on the substrate in a second direction perpendicular to the first direction.

2. The method according to claim 1, wherein the plurality of radiation spots extend substantially across the width of the substrate in the second direction.

3. A flat panel display manufactured according to the method of claim 1.

4. A device manufacturing method, comprising:

modulating a radiation beam using a patterning array of individually controllable elements;

projecting a plurality of radiation spots onto a substrate, based on the beam being modulated by the patterning array of individually controllable element, to generate a first plurality of spot exposures;

scanning the substrate in a first direction while projecting the plurality of radiation spots;

shifting the substrate relative to the patterning array of individually controllable elements in a second direction perpendicular to the first direction; and

projecting the plurality of radiation spots onto the substrate to generate a second plurality of spot exposures, wherein each of the second plurality of spot exposures formed on

the substrate alternates with each of the first plurality of spot exposures formed on the substrate in the second direction.

5. The method according to claim 4, wherein the plurality of radiation spots extend substantially across a width of the substrate in the second direction.

6. A flat panel display manufactured according to the method of claim 4.

7. A device manufacturing method, comprising:

modulating a radiation beam using first and second patterning arrays of individually controllable elements;

projecting a first plurality of radiation spots onto a substrate, based on the modulated beam being modulated by the first patterning array of individually controllable elements, to generate a first plurality of spot exposures on the substrate;

scanning the substrate in a first direction while projecting the first plurality of radiation spots; and

projecting a second plurality of radiation spots onto the substrate, based on the modulated beam being modulated by the second patterning array of individually controllable elements, to generate a second plurality of spot exposures on the substrate,

wherein each of the second plurality of spot exposures formed on the substrate alternates with each of the first plurality of spot exposures formed on the substrate in the first direction.

8. A flat panel display manufactured according to the method of claim 7.

9. A device manufacturing method, comprising:

modulating a radiation beam using a patterning array of individually controllable elements;

projecting a plurality of radiation spots onto a substrate, based on the modulated beam, to generate a first plurality of spot exposures on the substrate;

scanning the substrate in a first direction while projecting the plurality of radiation spots;

shifting the substrate relative to the patterning array of individually controllable elements in a second direction perpendicular to the first direction;

projecting the plurality of radiation spots onto the substrate to generate a second plurality of spot exposures on the substrate;

wherein each of the second plurality of spot exposures formed on the substrate alternates with each of the first plurality of spot exposures formed on the substrate in the first direction.

10. A flat panel display manufactured according to the method of claim 9.

11. A lithographic projection apparatus, comprising:

a first patterning array of individually controllable elements; and

a second patterning array of individually controllable elements located in a first direction relative to the first patterning array,

wherein the second patterning array is arranged such that each spot exposure generated by the second patterning array alternate with each spot exposure of the spot exposures generated by the first patterning array in a second direction perpendicular to the first direction.

12. A lithographic projection apparatus, comprising:

a patterning array of individually controllable elements that forms first and second pluralities of spot exposures on a substrate;

a shifting device that moves the substrate relative to the array of individually controllable elements in a second direction; and

a controller that controls the shifting device to shift the substrate relative to the patterning array, such that each spot exposure in the second plurality of spot exposures exposed by the patterning array of individually controllable elements is arranged between each spot exposure in the first plurality of spot exposures in the second direction.

13. The lithographic projection apparatus according to claim 12, wherein the first plurality of spot exposures are separated by at least a width of a spot exposure in which an intensity of exposing radiation is above a predetermined fraction of a maximum of the radiation.

14. A lithographic apparatus, comprising:

a patterning array of individually controllable elements;

a substrate table that supports a substrate; and

a position detecting device that detects a position of the substrate table in a first direction,

wherein the patterning array generates a plurality of spot exposures on the substrate,

wherein a distance between a center of adjacent ones of the spot exposures in the first direction is equal or greater than twice a width of the spot exposures in the first direction.

15. A lithographic projection apparatus, comprising:

a first patterning array of individually controllable elements; and

a second patterning array of individually controllable elements located in a first direction relative to the first patterning array,

wherein the second patterning array is arranged such that spot exposures generated by the second patterning array alternate with spot exposures generated by the first patterning array in the first direction.

16. A lithographic projection apparatus, comprising:

a patterning array of individually controllable elements that produces first and second pluralities of spot exposures on a substrate;

a shifting device that moves the substrate relative to the patterning array of individually controllable elements in a first direction; and

a controller that controls the shifting device to shift the substrate relative to the patterning array of individually controllable elements, such that each of the second plurality of spot exposures exposed by the patterning array of individually controllable elements is arranged between each of the first plurality of spot exposures in the first direction perpendicular to a second direction.