Photonic mems and structures
First Claim
1. A test structure configured to indicate residual stress, comprising:
- a reflective membrane connected to a substrate; and
an interferometric cavity formed between a portion of the membrane and a portion of the substrate, wherein the membrane behaves in a manner according to the residual stress of the test structure and modulates light indicative of a degree of residual stress.
3 Assignments
0 Petitions
Accused Products
Abstract
An interference modulator (Imod) incorporates anti-reflection coatings and/or micro-fabricated supplemental lighting sources. An efficient drive scheme is provided for matrix addressed arrays of IMods or other micromechanical devices. An improved color scheme provides greater flexibility. Electronic hardware can be field reconfigured to accommodate different display formats and/or application functions. An IMod'"'"'s electromechanical behavior can be decoupled from its optical behavior. An improved actuation means is provided, some one of which may be hidden from view. An IMod or IMod array is fabricated and used in conjunction with a MEMS switch or switch array. An IMod can be used for optical switching and modulation. Some IMods incorporate 2-D and 3-D photonic structures. A variety of applications for the modulation of light are discussed. A MEMS manufacturing and packaging approach is provided based on a continuous web fed process. IMods can be used as test structures for the evaluation of residual stress in deposited materials.
-
Citations
59 Claims
-
1. A test structure configured to indicate residual stress, comprising:
-
a reflective membrane connected to a substrate; and
an interferometric cavity formed between a portion of the membrane and a portion of the substrate, wherein the membrane behaves in a manner according to the residual stress of the test structure and modulates light indicative of a degree of residual stress. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
-
-
20. A system configured to determine residual stress, comprising:
-
one or more test structures, each test structure comprising a reflective membrane comprising a portion of a deposited film, wherein the test structure behaves in a manner according to the residual stress of the membrane and modulates light indicative of the degree of residual stress in the deposited film;
an imaging system positionable to receive modulated light reflecting from the one or more test structures and produce an image associated with the received light; and
a computer in communication with the imaging system, the computer configured to process the image and generate information relating to the residual stress of the deposited film. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37)
-
-
38. A method of determining residual stress, the method comprising:
-
interferometrically modulating light with a reflective membrane of a test structure, wherein the membrane behaves in a manner according to the residual stress of the test structure and modulates light indicative of the degree of residual stress;
receiving the modulated light; and
determining the residual stress of the test structure based on the received modulated light. - View Dependent Claims (39, 40, 41, 42, 43, 44, 45)
-
-
46. A method of determining residual stress in a deposited film, the method comprising:
-
collecting a first set of data indicating a first residual stress state of the one or more test structures disposed on a substrate;
depositing a film over the one or more test structures;
collecting a second set of data indicating a second residual stress state of the one or more test structures, the second set of data indicating residual stress in the deposited film; and
determining the residual stress of the deposited film based on comparing the collected first data and collected second data. - View Dependent Claims (47, 48, 49, 50, 51)
-
-
52. A method of manufacturing a test structure to indicate residual stress, the method comprising depositing a film on a substrate to form a deformable reflective membrane such that an interferometric cavity is formed between a portion of the membrane and a portion of the substrate, wherein the membrane is configured to behave in a manner according to the residual stress of the test structure and modulate light indicative of a degree of residual stress.
-
53. A system configured to determine residual stress in a deposited film, comprising:
-
means for interferometrically modulating light according to the degree of residual stress of the deposited film;
.means for receiving the modulated light; and
means for determining the residual stress of the test structure based on the received modulated light. - View Dependent Claims (54, 55, 56, 57, 58, 59)
-
Specification