MANUFACTURING METHOD OF LIGHT-COLLECTING DEVICE, LIGHT-COLLECTING DEVICE AND PHASE SHIFT MASK

• US 20060285228A1
• Filed: 06/14/2006
• Published: 12/21/2006
• Est. Priority Date: 06/17/2005
• Status: Active Grant

• Current Assignee: Panasonic Corporation (Panasonic Holdings Corporation)
• Original Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Inventors: TOSHIKIYO, Kimiaki, MATSUNO, Toshinobu, ONOZAWA, Kazutoshi, ISHII, Motonori, YOGO, Takanori
• Granted Patent: US 7,768,711 B2
• Time in Patent Office: Days
• US Class Current: 359/742
• CPC Class Codes: G02B 27/4205 having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
• CPC Class Codes: G02B 5/1847 Manufacturing methods
• CPC Class Codes: G02B 5/1876 Diffractive Fresnel lenses; Zone plates; Kinoforms G02B5/1842, G02B5/1847 take precedence; optical systems having diffractive correction means G02B27/0037; Fresnel lenses operating by refraction G02B3/08
• CPC Class Codes: G02B 5/1885 Arranged as a periodic array

Abstract

The present invention provides a method of manufacturing a lens, in which the method includes exposing a photoresist to light using a phase shift mask. Here, the phase shift mask includes layout portions respectively corresponding to pixels and lens, in which each of the layout portions has: a light-blocking portion which has a shape of a substantially circle or a substantially concentric zone; a light-transmitting portion which has a shape of a substantially circle or a substantially concentric zone; a phase shift portion which has a shape of a substantially circle or a substantially concentric zone; and a light-blocking frame. Furthermore, the light-transmitting portion, the light-blocking portion and the phase shift portion are arranged alternately so as to form concentric circles, and the light-blocking frame corresponds to a whole or a part of a perimeter of the lens.

Claims

1. A method of manufacturing a lens, said method comprising

exposing a photoresist to light using a phase shift mask,

wherein the phase shift mask includes

layout portions respectively corresponding to pixels and lenses,

wherein each of the layout portions has:

a light-blocking portion which has a shape of a substantially circle or a substantially concentric zone;

a light-transmitting portion which has a shape of a substantially circle or a substantially concentric zone;

a phase shift portion which has a shape of a substantially circle or a substantially concentric zone; and

a light-blocking frame,

wherein the light-transmitting portion, the light-blocking portion and the phase shift portion are arranged alternately so as to form concentric circles, and

the light-blocking frame corresponds to a whole or a part of a perimeter of the lens.

2. The method of manufacturing a lens according to claim 1,

wherein a width of the light-blocking frame is as large as a minimum manufacturing dimension of the phase shift mask.

3. The method of manufacturing a lens according to claim 1,

wherein a width of the light-blocking frame is approximately 0.4 μ

m.

4. The method of manufacturing a lens according to claim 1,

wherein the layout portions include a first layout portion corresponding to a first pixel, and four adjacent layout portions corresponding to four pixels which are respectively adjacent in all four directions to the first pixel,

phase shift portions are positioned in regions of the adjacent layout portions, the regions corresponding to a region of the first layout portion in which a light-transmitting portion is positioned, and

light-transmitting portions are positioned in regions of the adjacent layout portions, the regions corresponding to a region of the first layout portion in which a phase shift portion is positioned.

5. The method of manufacturing a lens according to claim 1,

wherein the layout portions include a first layout portion corresponding to a first pixel, and a second layout portion corresponding to a pixel adjacent to the first pixel,

a first section and a second section are included in a light-blocking frame at which the first layout portion and the second layout portion are adjacent to each other,

the first section is smaller than the second section,

the first section is a section having phase shift portions on both sides of the light-blocking frame, and is a section having light-transmitting portions on both sides of the light-blocking frame, and

the second section is a section having a phase shift portion on one side of the light-blocking frame and a light-transmitting portion on the other side of the light-blocking frame.

6. The method of manufacturing a lens according to claim 1,

wherein the layout portions include a first layout portion corresponding to a first pixel and a second layout portion corresponding to a second pixel adjacent to the first pixel,

a light-blocking frame is positioned in a specific section in a boundary between the first layout portion and the second layout portion, and

the specific section is a section having a phase shift portion on one side of the boundary and a light-transmitting portion on the other side of the boundary.

7. The method of manufacturing a lens according to claim 6,

wherein the specific section is smaller than other sections in the boundary of a perimeter of each layout portion.

8. A lens comprising:

light-collecting films which have a shape of substantially circles or substantially concentric zones, and

a frame which surrounds a whole or a part of a perimeter of the lens.

9. The lens device according to claim 8,

wherein the width of the frame is 0.1 μ

m or less.

10. The lens according to claim 8,

wherein the frame is made of a same material used for said light-transmitting film or is made of an absence of said light-transmitting film.

11. The lens according to claim 10,

wherein a width of the frame is obtained approximately by dividing a minimum manufacturing dimension of a phase shift mask by a light-exposure ratio.

12. The lens according to claim 11,

wherein the width of the frame is 0.1 μ

m or less.

13. A phase shift mask used for manufacturing a lens, said phase shift mask comprising

layout portions respectively corresponding to pixels and lenses,

wherein each of the layout portions has:

a light-blocking portion which has a shape of a substantially circle or a substantially concentric zone;

a light-transmitting portion which has a shape of a substantially circle or a substantially concentric zone;

a phase shift portion which has a shape of a substantially circle or a substantially concentric zone; and

a light-blocking frame,

wherein the light-transmitting portion, the light-blocking portion and the phase shift portion are arranged alternately so as to form concentric circles, and

the light-blocking frame corresponds to a whole or a part of a perimeter of the lens.

14. The phase shift mask according to claim 13,

wherein a width of the light-blocking frame is as large as a minimum manufacturing dimension of the phase shift mask.

15. The phase shift mask according to claim 13,

wherein a width of the light-blocking frame is approximately 0.4 μ

m.