Method for fabricating semiconductor device and semiconductor device
First Claim
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1. A method for fabricating a semiconductor device comprising the steps of:
- forming a nitrogen-containing layer in an exposed portion of a copper interconnect formed in an insulating film provided on a substrate; and
forming an interlayer insulating film on said nitrogen-containing layer through plasma CVD performed by using, as a material, an organic silicon compound having a siloxane (Si—
O—
Si) bond.
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Abstract
A method for fabricating a semiconductor device includes the steps of forming a nitrogen-containing layer in an exposed portion of a copper interconnect formed in an insulating film provided on a substrate; and forming an interlayer insulating film on the nitrogen-containing layer through plasma CVD performed by using, as a material, an organic silicon compound having a siloxane (Si—O—Si) bond.
12 Citations
8 Claims
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1. A method for fabricating a semiconductor device comprising the steps of:
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forming a nitrogen-containing layer in an exposed portion of a copper interconnect formed in an insulating film provided on a substrate; and
forming an interlayer insulating film on said nitrogen-containing layer through plasma CVD performed by using, as a material, an organic silicon compound having a siloxane (Si—
O—
Si) bond. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A semiconductor device comprising:
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a nitrogen-containing layer formed in an exposed portion of a copper interconnect formed in an insulating film provided on a substrate; and
an interlayer insulating film formed on said nitrogen-containing layer through plasma CVD performed by using, as a material, an organic silicon compound having a siloxane (Si—
O—
Si) bond.
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Specification