Arc plasma jet and method of use for chemical scrubbing system
First Claim
17. A chemical synthesis apparatus comprising:
- a first chamber configured to generate a plasma jet therein;
a second chamber in communication with said first chamber;
a mixing region;
a first inlet for injecting at least two substances into said first chamber and into said jet whereby said jet transforms said substances into a compound in said mixing region, said compound thereafter flowing into said second chamber;
a second inlet for injecting water and/or gas into said first chamber into said mixing region; and
said second chamber configured to quench said compound when said compound is in said second chamber to thereby stabilize said compound.
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Abstract
A chemical scrubbing apparatus includes a first chamber configured to generate a non-rotating arc therein, a second chamber in communication with the first chamber, and a gas injector injecting a first gas into said arc to generate a plasma jet. The apparatus further includes a first inlet for injecting a substance into the first chamber, a mixing region, the substance mixing with the plasma jet in the mixing region whereby the plasma jet disassociates the chemical constituents of the substance in the mixing region, and a second inlet for directing a second gas and/or water into the first chamber at the mixing region. The mixing region directs the chemical constituents into the second chamber, and the second chamber is adapted to quench the chemical constituents to reduce the reactivity of the chemical constituents to thereby maintain their disassociation.
29 Citations
46 Claims
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17. A chemical synthesis apparatus comprising:
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a first chamber configured to generate a plasma jet therein;
a second chamber in communication with said first chamber;
a mixing region;
a first inlet for injecting at least two substances into said first chamber and into said jet whereby said jet transforms said substances into a compound in said mixing region, said compound thereafter flowing into said second chamber;
a second inlet for injecting water and/or gas into said first chamber into said mixing region; and
said second chamber configured to quench said compound when said compound is in said second chamber to thereby stabilize said compound. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25)
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26. A method of chemical abatement comprising the steps of:
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generating a gas ion stream;
flowing a waste medium into the gas ion stream;
mixing the waste medium with the gas ion stream in a mixing region to disassociate the chemical constituents of the waste medium into a non-toxic form; and
quenching the chemical constituents to stabilize the disassociated state of the chemical constituents. - View Dependent Claims (27, 28, 29, 30, 31, 32, 33, 34)
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35. A method of chemical synthesis comprising:
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generating a gas ion stream;
flowing at least two substances into the gas ion stream;
mixing the gas ion stream and the substances to energize the substances to a more reactive state whereby the substances associate to form a chemical compound; and
quenching the chemical compound to stabilize the chemical compound in its existing form. - View Dependent Claims (36, 37, 38, 39)
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40. A chemical synthesis apparatus comprising:
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a chamber configured to generate a gas ion stream;
a mixing region;
a first inlet for injecting at least two substances into said chamber and into said gas ion stream whereby said ion stream transforms said substances into a compound in said mixing region, said compound thereafter flowing into said second chamber;
an oxidant generator for generating an oxidant;
a second inlet for injecting at least the oxidant into said first chamber into said mixing region; and
said apparatus adapted to quench said compound to thereby stabilize said compound. - View Dependent Claims (1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 41, 42, 43, 44, 45, 46)
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44-1. The chemical synthesis apparatus according to claim 43, wherein said oxidant generator comprises an oxygen generator.
Specification