Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
First Claim
1. A computer-implemented method for sorting defects in a design pattern of a reticle, comprising:
- searching for defects of interest in inspection data using priority information and defect attributes associated with individual defects in combination with one or more characteristics of a region proximate the individual defects and one or more characteristics of the individual defects, wherein the inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable, and wherein the images comprise at least one reference image and at least one modulated image; and
assigning one or more identifiers to the defects of interest.
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Accused Products
Abstract
Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
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Citations
40 Claims
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1. A computer-implemented method for sorting defects in a design pattern of a reticle, comprising:
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searching for defects of interest in inspection data using priority information and defect attributes associated with individual defects in combination with one or more characteristics of a region proximate the individual defects and one or more characteristics of the individual defects, wherein the inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable, and wherein the images comprise at least one reference image and at least one modulated image; and
assigning one or more identifiers to the defects of interest. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A computer-implemented method for detecting defects in a design pattern of a reticle, comprising:
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acquiring images of the reticle for different values of a lithographic variable, wherein the images comprise two or more reference images obtained at nominal values and one or more modulated images;
generating a composite reference image from the two or more reference images;
comparing at least two of the images, wherein the at least two of the images comprise the composite reference image; and
determining if a defect is present in the design pattern using results of said comparing. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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32. A computer-implemented method for detecting defects in a design pattern of a reticle, comprising:
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acquiring images of an entire swath of dies printed on a wafer using the reticle, wherein at least two of the dies are printed at different values of a lithographic variable;
subsequent to said acquiring, comparing at least two of the images; and
determining if a defect is present in the design pattern using results of said comparing. - View Dependent Claims (33, 34, 35, 36)
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37. A computer-implemented method for detecting and sorting defects in a design pattern of a reticle, comprising:
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acquiring images of the reticle for different values of a lithographic variable;
comparing at least two of the images;
determining if pixel differences in the at least two of the images follow a typical or atypical trend over the different values of the lithographic variable. - View Dependent Claims (38, 39, 40)
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Specification