Contacts fabric using heterostructure of metal/semiconductor nanorods and fabrication method thereof

• US 20060292839A1
• Filed: 02/24/2004
• Published: 12/28/2006
• Est. Priority Date: 06/09/2003
• Status: Abandoned Application

• Current Assignee: Postech Foundation
• Original Assignee: Postech Foundation
• Inventors: Yi, Gyu Chul, Park, Won Il
• Application Number:
  US10/558,899
• Publication Number:
  US 20060292839A1
• Time in Patent Office: Days
• US Class Current: 438/570
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: H01L 21/28537 Deposition of Schottky electrodes
• CPC Class Codes: H01L 21/2855 by physical means, e.g. sputtering, evaporation H01L21/28518 - H01L21/28537 and H01L21/28568 take precedence
• CPC Class Codes: H01L 21/44 Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428
• CPC Class Codes: H01L 29/0665 the shape of the body defining a nanostructure nanotechnology per se B82B
• CPC Class Codes: H01L 29/0673 oriented parallel to a substrate
• CPC Class Codes: H01L 29/0676 oriented perpendicular or at an angle to a substrate
• CPC Class Codes: H01L 29/22 including, apart from doping materials or other impurities, only AIIBVI compounds
• CPC Class Codes: H01L 29/45 Ohmic electrodes
• CPC Class Codes: H01L 29/452 on AIII-BV compounds
• CPC Class Codes: H01L 29/456 on silicon
• CPC Class Codes: H01L 29/47 Schottky barrier electrodes H01L29/435 takes precedence
• CPC Class Codes: H01L 29/475 on AIII-BV compounds
• CPC Class Codes: H01L 31/035281 Shape of the body
• CPC Class Codes: H01L 31/108 the potential barrier being of the Schottky type
• CPC Class Codes: H01L 33/20 with a particular shape, e.g. curved or truncated substrate
• CPC Class Codes: Y02E 10/50 Photovoltaic [PV] energy

Abstract

Provided are a contact fabric using a heterostructure of metal/semiconductor nanorods and a method of manufacturing the same. An ohmic contact fabric having a low contact resistance or a Schottky contact fabric having a rectification characteristic is formed by selectively depositing metal of nano-sizes onto predetermined portions of zinc oxide/semiconductor nanorods and controlling the work function of the deposited metal and the interfacial characteristics of metal/zinc oxide. The contact fabric can be applied to various nano-sized electronic devices, including Schottky diodes, optical devices, and arrays thereof.

Claims

1. A contact fabric using a heterostructure of metal/semiconductor nanorods, the contact fabric comprising:

semiconductor nanorods grown on a predetermined base material; and

metal deposited on predetermined portions of the semiconductor nanorods,

wherein there is a low contact resistance ohmic characteristic or a rectifying Schottky characteristic between the nanorods and the metal depending on characteristics of interfaces between the nanorods and the metal and depending on the difference between work functions.

2. The contact fabric of claim 1, being used as a Schottky contact fabric or an ohmic contact fabric in a Schottky diode, a transistor, an optical detecting device, a light-emitting device, a sensor device, a nano-system, an integrated circuit, and an array circuit.

3. The contact fabric of claim 1, wherein the nanorods and the contact fabric have a diameter less than 500 nm.

4. The contact fabric of claim 1, wherein the semiconductor nanorods include at least one material selected from the group consisting of zinc oxide, titanium oxide, GaN, Si, InP, InAs, GaAs, and an alloy thereof.

5. The contact fabric of claim 2, wherein when the semiconductor nanorods are n-type semiconductors and form the Schottky contact fabric with the metal, the metal deposited on the semiconductor nanorods includes at least one material selected from the group consisting of Ni, Pt, Pd, Au, W, and silicide metals, including PtSi and NiSi, wherein each of the listed materials has a work function that is greater than the affinity of the semiconductor nanorods to electrons.

6. The contact fabric of claim 2, wherein when the semiconductor nanorods are n-type semiconductors and form the ohmic contact fabric with the metal, the metal directly deposited on the semiconductor nanorods includes at least one material selected from the group consisting of Ti, Al, and In, which have a smaller work function than the work function of the semiconductor nanorods.

7. The contact fabric of claim 6, wherein Au or Pt is deposited on the metal.

8. The contact fabric of claim 5, wherein thermal annealing is performed at a temperature of less than 1,000°

C. after the metal is deposited to improve the electrical characteristics of the contact fabric.

9. A method of fabricating a contact fabric using a heterostructure of metal/semiconductor nanorods, the method comprising:

growing semiconductor nanorods on a predetermined base material vertically or in a direction; and

depositing a metal onto predetermined portions of the semiconductor nanorods using a sputtering method or a thermal or e-beam evaporation method,

wherein there is a low contact resistance ohmic characteristic or a rectifying Schottky characteristic between the nanorods and the metal depending on characteristics of interfaces between the nanorods and the metal and depending on the difference between work functions.

10. The method of claim 9, wherein the grown nanorods and the deposited contact fabric have a diameter less than 500 nm.

11. The method of claim 9, wherein the semiconductor nanorods include at least one material selected from the group consisting of zinc oxide, titanium oxide, GaN, Si, InP, InAs, GaAs, and an alloy thereof.

12. The method of claim 9, wherein when the semiconductor nanorods are n-type semiconductors and form a Schottky contact fabric with the metal, the metal deposited on the semiconductor nanorods includes at least one material selected from the group consisting of Ni, Pt, Pd, Au, W, and silicide metals, including PtSi and NiSi, wherein each of the materials has a work function that is greater than the affinity of the semiconductor nanorods to electrons.

13. The method of claim 9, wherein when the semiconductor nanorods are n-type semiconductors and form an ohmic contact fabric with the metal, the metal directly deposited on the semiconductor nanorods includes at least one material selected from the group consisting of Ti, Al, and In, which have a smaller work function than the work function of the semiconductor nanorods.

14. The method of claim 13, further comprising depositing Au or Pt onto the metal.

15. The method of claim 12, further comprising performing thermal annealing at a temperature of less than 1,000°

C. after the metal is deposited to improve the electrical characteristics of the contact fabric.