Method of forming fine pattern, liquid crystal display device having a fine pattern and fabricating method thereof
First Claim
1. A method of forming fine pattern, comprising:
- forming a photo-resist pattern on a conductive layer, the photo-resist pattern having a minimum line width corresponding to an exposure resolution of an exposure device; and
over-etching the conductive layer by an etching process using the photo-resist pattern as a mask to form an electrode pattern having a line width narrower than the exposure resolution of the exposure device.
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Accused Products
Abstract
This invention relates to a method of forming fine pattern that is adaptive for forming a fine pattern without limit of an exposure resolution, a liquid crystal display device and a fabricating method. The method of forming fine pattern comprises forming a photo-resist pattern on a transparent conductive layer. The photo-resist pattern having a minimum line width corresponding to an exposure resolution of an exposure device. The method further comprises over-etching the transparent conductive layer by an etching process using the photo-resist pattern as a mask to form an electrode pattern having a line width narrower than the exposure resolution of the exposure device.
30 Citations
31 Claims
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1. A method of forming fine pattern, comprising:
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forming a photo-resist pattern on a conductive layer, the photo-resist pattern having a minimum line width corresponding to an exposure resolution of an exposure device; and
over-etching the conductive layer by an etching process using the photo-resist pattern as a mask to form an electrode pattern having a line width narrower than the exposure resolution of the exposure device. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A liquid crystal display device, comprising:
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a data line that crosses a gate line to define a pixel area;
a thin film transistor connected to the gate line and the data line;
a pixel electrode connected to the thin film transistor in the pixel area;
a common electrode along with the pixel electrode; and
a common line connected to the common electrode, wherein at least one of the pixel electrode and the common electrode is formed of a conductive layer and in an electrode pattern having a line width narrower than an exposure resolution of an exposure device by an over-etching process using a photo-resist pattern as a mask. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A method of fabricating a liquid crystal display device,
forming a conductive layer; -
forming a photo-resist pattern on the conductive layer, the photo-resist pattern including a portion having a minimum line width corresponding to an exposure resolution of an exposure device; and
over-etching the transparent conductive layer by an etching process using the photo-resist pattern as a mask to form an electrode pattern having a line width narrower than the exposure resolution of the exposure device. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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Specification