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Method of forming fine pattern, liquid crystal display device having a fine pattern and fabricating method thereof

  • US 20070001979A1
  • Filed: 06/23/2006
  • Published: 01/04/2007
  • Est. Priority Date: 06/30/2005
  • Status: Active Grant
First Claim
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1. A method of forming fine pattern, comprising:

  • forming a photo-resist pattern on a conductive layer, the photo-resist pattern having a minimum line width corresponding to an exposure resolution of an exposure device; and

    over-etching the conductive layer by an etching process using the photo-resist pattern as a mask to form an electrode pattern having a line width narrower than the exposure resolution of the exposure device.

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