Exposure apparatus, exposure method, and device fabrication method
First Claim
1. An exposure apparatus that forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid, wherein a spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at an outer circumference of the immersion area.
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Accused Products
Abstract
An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.
33 Citations
29 Claims
- 1. An exposure apparatus that forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid, wherein a spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at an outer circumference of the immersion area.
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12. An exposure apparatus that exposes a substrate by filling a gap between the substrate and a projection optical system with a liquid, and projecting a pattern image onto the substrate through the projection optical system and the liquid, wherein:
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an immersion area that includes a projection area of the projection optical system and that is continually filled with the liquid during an exposure operation, and a spare immersion area provided to an outer circumference of the immersion area are formed; and
a first area wherein the liquid exists and a second area wherein the liquid does not exist are formed in the spare immersion area during the exposure operation, and positions of the first area and the second area inside the spare immersion area change in accordance with the exposure operation.
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- 13. An exposure method for exposing a substrate by forming an immersion area by supplying a liquid onto part of a substrate, which includes a projection area of a projection optical system, and projecting a pattern image onto the substrate through the projection optical system and the liquid positioned between the projection optical system and the substrate, the method comprising the step of disposing part of the liquid supplied onto the substrate in a spare immersion area that is formed at an outer circumference of the immersion area.
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16. An exposure apparatus that exposes a substrate by forming an immersion area by supplying a liquid onto part of the substrate, and projecting a pattern image onto the substrate through the liquid, wherein the immersion area has a first area that includes an area wherein the pattern image is projected;
- and a second area, which is proximate to the first area, wherein the liquid is capable of moving to and from the first area.
- View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25)
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26. An exposure apparatus that exposes a substrate by forming an immersion area by supplying a liquid onto a part of the substrate, and projecting a pattern image onto the substrate through the liquid, the apparatus comprising:
a liquid holding member for forming the immersion area, wherein the immersion area includes a first area, wherein the liquid is continually held during exposure, and a second area, which is capable of moving with respect to the liquid holding member during the exposure. - View Dependent Claims (27)
Specification