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Lithographic apparatus, radiation beam inspection device, method of inspecting a beam of radiation and device manufacturing method

  • US 20070002301A1
  • Filed: 06/29/2005
  • Published: 01/04/2007
  • Est. Priority Date: 06/29/2005
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus, comprising:

  • a patterning device that modulates a beam of radiation;

    a projection system that projects the modulated beam onto a target portion of a substrate; and

    a radiation beam inspection device that comprises, a barrier to the radiation beam having an aperture that permits a portion of the radiation beam to pass through the barrier, and a radiation sensor that detects intensity of the radiation passing through the aperture and a position, relative to the aperture, at which the radiation passing through the aperture is incident on the radiation sensor.

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