SYSTEMS AND METHODS FOR FABRICATING BLANKS FOR MICROSTRUCTURE MASTERS BY IMAGING A RADIATION SENSITIVE LAYER SANDWICHED BETWEEN OUTER LAYERS, AND BLANKS FOR MICROSTRUCTURE MASTERS FABRICATED THEREBY

• US 20070003868A1
• Filed: 08/17/2006
• Published: 01/04/2007
• Est. Priority Date: 09/11/2003
• Status: Abandoned Application

• Current Assignee: Bright View Technologies Corporation (Tredegar Corporation)
• Original Assignee: Bright View Technologies, Inc. (Tredegar Corporation)
• Inventors: Wood, Robert, Freese, Robert, Rinehart, Thomas
• Application Number:
  US11/465,373
• Publication Number:
  US 20070003868A1
• Time in Patent Office: Days
• US Class Current: 430/270.100
• CPC Class Codes: G02B 3/0025 Machining, e.g. grinding, polishing, diamond turning, manufacturing of mould parts
• CPC Class Codes: G02B 3/0031 Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
• CPC Class Codes: G02B 5/1852 using mechanical means, e.g. ruling with diamond tool, moulding
• CPC Class Codes: G02B 5/1857 using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
• CPC Class Codes: G03F 7/0005 Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
• CPC Class Codes: G03F 7/0015 Production of aperture devices, microporous systems or stamps
• CPC Class Codes: G03F 7/161 using a previously coated surface, e.g. by stamping or by transfer lamination
• CPC Class Codes: Y10S 430/146 Laser beam

Abstract

Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined in the radiation sensitive layer are developed. The radiation sensitive layer sandwiched between the pair of outer layers may be fabricated as webs, to provide microstructure master blanks.

Claims

1. An apparatus for fabricating a blank for a microstructure master, comprising:

a radiation sensitive material coating station that is configured to coat a layer of radiation sensitive material that is configured to accept an image of microstructures, on a first flexible web; and

a laminating station that is configured to laminate a second flexible web to the layer of radiation sensitive material that is configured to accept an image of microstructures, opposite the first flexible web.

2. An apparatus according to claim 1 wherein the layer of radiation sensitive material is a layer of negative photoresist.

3. An apparatus according to claim 1 wherein the first and second flexible webs are identical.

4. An apparatus according to claim 2 wherein the layer of negative photoresist is sensitive to radiation at a predetermined frequency and wherein the first flexible web is transparent to radiation at the predetermined frequency.

5. An apparatus according to claim 4 wherein the second flexible web is opaque to radiation at the predetermined frequency.

6. A method for fabricating a blank for a microstructure master, comprising:

coating a layer of radiation sensitive material that is configured to accept an image of microstructures, on a first flexible web; and

laminating a second flexible web to the layer of radiation sensitive material that is configured to accept an image of microstructures, opposite the first flexible web.

7. A method according to claim 6 wherein the layer of radiation sensitive material is a layer of negative photoresist.

8. A method according to claim 6 wherein the first and second flexible webs are identical.

9. A method according to claim 7 wherein the layer of negative photoresist is sensitive to radiation at a predetermined frequency and wherein the first flexible web is transparent to radiation at the predetermined frequency.

10. A method according to claim 9 wherein the second flexible web is opaque to radiation at the predetermined frequency.

11. A blank for a microstructure master comprising:

a pair of closely spaced apart, flexible webs; and

a radiation sensitive layer that is configured to accept an image of microstructures, between the pair of closely spaced apart flexible webs.

12. A blank according to claim 11 wherein the radiation sensitive layer contains therein a latent image of microstructures.

13. A blank according to claim 11 wherein the radiation sensitive layer is a negative photoresist layer.

14. A blank according to claim 13 wherein the pair of flexible webs are identical.

15. A blank according to claim 13 wherein the negative photoresist layer is sensitive to radiation at a predetermined frequency and wherein one of the pair of flexible webs is transparent to radiation at the predetermined frequency.

16. A blank according to claim 15 wherein the other of the pair of flexible webs is opaque to radiation at the predetermined frequency.