Film forming method
First Claim
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1. A film forming method for forming a thin film including a metal on a substrate by alternately supplying the substrate with a film forming material including the metal and a reducing gas, wherein at least a part of the film forming material is dissociated or decomposed in gaseous state by a plasma and is supplied onto the substrate.
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Abstract
A film forming method is provided for forming a thin film including a metal on a substrate by alternately supplying the substrate with a film forming material including the metal and a reducing gas. At least a part of the film forming material is dissociated or decomposed in vapor phase by plasma and supplied onto the substrate.
19 Citations
15 Claims
- 1. A film forming method for forming a thin film including a metal on a substrate by alternately supplying the substrate with a film forming material including the metal and a reducing gas, wherein at least a part of the film forming material is dissociated or decomposed in gaseous state by a plasma and is supplied onto the substrate.
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8. A film forming method for forming a thin film including a metal on a substrate in a processing chamber, comprising the steps of;
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(a) supplying a film forming material including the metal to the substrate;
(b) removing a residual gas in the processing chamber after the supply of the film forming material is stopped;
(c) supplying a reducing gas to the substrate in the processing chamber; and
(d) removing a residual gas in the processing chamber after the supply of the reducing gas is stopped, wherein the thin film is formed by repeatedly performing the steps (a) to (d), and, in the step (a), at least a part of the film forming material is dissociated or decomposed in gaseous state by a plasma and supplied onto the substrate. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A computer storage medium storing a software executable by a computer system, wherein, when a thin film including a metal is formed on a substrate by repeating the following steps of;
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(a) supplying a film forming material including the metal to the substrate in a processing chamber;
(b) removing a residual gas in the processing chamber after a supply of the film forming material is stopped;
(c) supplying a reducing gas to the substrate in the processing chamber; and
(d) removing a residual gas in the processing chamber after the supply of the reducing gas is stopped, the software controls a gas plasma in the processing chamber so that at least a part of the film forming material is dissociated or decomposed in gaseous state by the plasma and supplied onto the substrate in the step (a).
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Specification